DUV Spectrophotometer

Acton Research

Acton, MA

An automated deep-UV spectrophotometer measures samples of thin-film coatings, photoresists, silicon wafers, deep-UV optics, dry fused silica, and calcium fluoride under vacuum or purged conditions. The CAMS-507 DUV provides precise, repeatable reflectance, absorption, and transmission measurements in the wavelength range of 120 to >350 nm. The instrument is available with an option for measuring samples at 157 or 193 nm under polarized conditions. The fully computerized system features an automated eight-position sample holder that can be repositioned during operation in order to change the measurement angle.

Surface-Mount Gas Delivery System

Syncro Vac

Milpitas, CA

A surface-mount gas delivery system features built-in secondary containment, enabling it to be used with hazardous and toxic materials such as those involved in CVD processes. Made of Type 316L stainless steel, The Cube features multiple gas streams and has a modular design to ease installation and provide access to problem areas. Conventional C-seals are used for primary containment, while fittings for secondary containment use standard O-rings. A contaminated area of the system can be disassembled, cleaned, electropolished again, and refitted without involving the entire assembly. The Cube has a snap-in block system that uses easily changed-over heating cartridges to ensure precise temperature control throughout the gas stream.

High-Density Plasma Sources

Manitou Systems

Danbury, CT

The Delta Glow family of plasma sources generates dense gas plasma for thin-film deposition, etching, and material surface modification applications. The sources are useful in activating and removing water vapor from chamber walls and substrate surfaces, and they reduce oxygen contamination and deposited film inclusions. The high-energy plasma sources bombard a vacuum system's surfaces with electrons and ions to stimulate desorption of bonded water, resulting in a clean system with minimal film contamination during later processing. Each of the three models has a high-efficiency RF power-delivery system but can run with an existing RF power system. The vacuum chamber interface is a standard ISO-type flange or can be a custom interface plate. A standard quartz reactor tube is the only consumable.

3-D SEM

Applied Materials, PDC Group

Santa Clara, CA

Designed to detect yield-killing excursions early in the process, the VersaSEM 3-D metrology system views images of sidewall profiles down to 0.10 µm. Resolution of the slope is up to 10x greater than that of existing scanning electron microscopes. Stereoscopic sidewall imaging gives operators a view of the slope and shape of the most advanced device features, including high-aspect-ratio contact holes and trenches, that is unavailable with top-down CD SEMs. Unlike cross-section SEMs, the instrument allows operators to quickly monitor wafers between steps and alert users to process problems. Corrective cycle time can be reduced from hours to less than one minute. The tool's in-line capability can also eliminate the need for test wafers. Because maintaining slope shape is important to prevent voids in dual damascene structures, the microscope is suitable for use with copper processes. The 3-D system features automated operation, shared database capability, and off-line programming. The instrument's MTBF rate is >1500 hours, and it accommodates both 200- and 300-mm wafers.

Glass-Ceramic Connectors

Ceramaseal

New Lebanon, NY

High-density, high-temperature glass-ceramic circular connectors are designed for use in challenging environments. The connector system consists of hermetically sealed glass-ceramic headers with as many as 41 gold-plated pins and a standard plug on the air side. Any of three design options may be selected for the vacuum side: a double-ended design with a threaded plug connection, a straight-pin design with 0.040-in.-diam pins for connections, or a solder-pin design with solder-cup terminations. The connectors have shells made of Type 304 stainless steel, are UHV compatible, and are rated for operating temperatures ranging from ­269° to 400°C. They feature a minimum helium leak rate of 1 x 10^­9 std cm³/sec.

FTIR Metrology Tool

On-Line Technologies

East Hartford, CT

The Film-Expert 300 performs FTIR measurements of advanced and chemically complex thin films on wafers up to 300 mm. Combining advanced optics and model-based analysis for the extraction of detailed chemical and physical information, the tool provides quantitative data from the reflectance measurements of most semiconducting and dielectric layers. The system can be configured for manual or semiautomated wafer handling. It measures thicknesses of multiple layers, transition layer thickness, functional-group composition, chemical composition, and strain level. Applications include low-k dielectrics, photoresists, episilicon, polysilicon, SOI, gate oxides, nitrides, oxides, deep trench layers, shallow junctions, and thin-metal layers.

Computerized Grounding Meter

Static Solutions

Marlborough, MA

The CT-8900 combination meter for testing wrist straps and foot grounders features software upgrades that make it possible to automatically test a technician's wrist strap and heel grounder. The computer-interfaced meter is able to display, record, store, and print out the exact resistivity value for as many as 2500 workers, thus speeding log-in. Manufactured by an ISO 9000­compliant company, the easy-to-use meter is CE approved and NIST traceable.

Vacuum Gauge

Hastings Instruments

Hampton, VA

The Model 2002 dual-sensor vacuum gauge provides measurements over pressure ranges from 10^­4 to 1000 Torr. The instrument consists of a digital microprocessor-based display unit and, in a single tube shell, a micro-Pirani and a piezoresistive-bridge sensing element. It features automatic crossover calibration, fast dynamic response, and a compact, rugged design. Used in applications requiring accuracy, the instrument's small size and robust construction avoid the disadvantages of bulky convection-driven Pirani tubes and capacitance manometers.

Disk Measuring System

GSI Lumonics

Kanata, ON, Canada

A turnkey noncontact disk-substrate measurement system offers manufacturers of disk media repeatable process control analysis of critical production characteristics. Based on the View Voyager metrology platform, the system can automatically inspect rigid disk substrates of any material. Measurements of inner diameter, outside diameter, roundness, chamfer width, chamfer angle, flatness, texture zone density, and all possible concentricity variations are highly precise. Universal vacuum tooling fixtures make the platform adaptable to changing production requirements; 3-, 9-, and 20-station disk fixtures each support up to four different substrate size formats, allowing the system to inspect 130-, 95-, 84-, and 65-mm substrates.

Particle Counter

ART Instruments

Grants Pass, OR

The FMPC facility-monitoring particle counter wall-mounts close to the critical manufacturing process to be monitored on-line and provides continuous information. Its host computer sets all measurement parameters, and data are collected via an RS-485 interface with a standard T-568 B cable over distances as great as 4000 ft. The easily integrated 12-oz, 4.192 x 2.663 x 1.618-in. monitor features 0.3- and 0.5-µm channels and a flow rate of 0.1 cu ft/min. Counting efficiency is 50% for 0.3-µm particles and 100% for particles >0.45 µm, in accordance with Japanese industry standards. The device requires at least 18 in. Hg of vacuum at the critical orifice and 9­28 V dc of input power, internally regulated to 5 V dc.

Vacuum Chambers

Atlas Technologies

Port Townsend, WA

Aluminum vacuum chambers are offered with interiors lined with thick, hard oxide coatings for protection against the effects of halogen gases and other exotic chemicals encountered in CVD and MOCVD processing. Thus coated, the ultra-high-vacuum chambers behave like ceramic chambers. Not only can the aluminum accept oxide coating for chemical resistance, it can be baked quickly, has a very low water content, displays a low level of nuclear activation, and is lighter in weight than stainless steel. The company's bimetallic flange, with a durable stainless-steel knife edge and an aluminum body, provides the aluminum vacuum chambers with an ultra-high-vacuum seal.

SEM Review System

KLA-Tencor

San Jose, CA

The eV300 automated scanning electron microscope review system performs in-line monitoring and engineering analysis applications for geometries 0.18µm. The tool can rapidly capture and classify voltage contrast defects as well as defects beneath the size horizon of optical inspection systems. Designed for defect review and analysis in a high-volume wafer production environment, it can be configured to handle either 200- or 300-mm wafers. The system inputs defect files from integrated inspection and review tools; sorts or filters the data to speed review; and then automatically provides images, classification results, and elemental data related to the captured defects. It is capable of 19 keV, which optimizes the elemental analysis of copper-related defects and allows differentiation of the peak overlaps of tungsten silicide and titanium nitride layers.

Fluid Process Control Head

Burkert Contromatic

Irvine, CA

The Type 8630 fully integrated control-head unit provides on-off or continuous process control of fluid delivery systems, offering accuracy within 1%. The compact stand-alone module functions as a position sensor, microprocessor controller, and pilot actuator. Easy to install, it features pilot valves integrated with a PID controller with internal and external set points, two feedback limit switches, and an ASI-bus connection for easy networking. A variety of electrical interfaces facilitate connection with other sensors and switches. The continuous version of the control head accepts PT 100, 4­20-mA, or frequency sensor inputs. Customized systems can be configured from brass, stainless-steel, or plastic fluidic-body materials with different finishes and pipe connections.

Automated Manufacturing Software

National Instruments

Austin, TX

FABTalk software can be used to develop automated semiconductor manufacturing applications that meet the SECS protocol without having to write lengthy C code. Compatible with LabVIEW 5.1/5.01, the software consists of three components. The SECS Toolkit lets programmers construct SECS-protocol messages and includes on-line documentation, tutorials, and application examples. SECS Spy is a debugging utility that permits viewing of messages sent between the host PC and the equipment it controls. The virtual communication (VCOM) port allows users to develop code and send and receive equipment messages on a single computer. Once an application is developed and tested, the programmer can replace VCOM communication with standard system communication ports.

UPW Piping System

Harvel Plastics

Easton, PA

A low-extractable piping system for ultrapure water applications is produced from a specially formulated noncontaminating PVC compound that has been tested to show lower TOC and trace-metal levels than those of conventional PVC and other piping materials. LXT piping systems have ultrasmooth interior walls, strong Schedule 80 dimensions for pressure service, good resistance to corrosion and chemicals, high impact strength, and low thermal conductivity. Quick installation by means of a one-step, fast-curing solvent-cement joining system minimizes TOC contamination. Component translucency facilitates visual inspection of joint integrity. A complete line of pipe, fittings, and valves is offered in IPS sizes with diameters of 1/4 to 4 in.

Spectroradiometer

Ocean Optics

Dunedin, FL

The IRRAD2000 fiber-optic spectroradiometer measures absolute spectral intensities between 350 and 950 nm, including irradiance and photopic quantities. The instrument provides absolute spectral intensity values in relation to wavelengths at the fiber entrance port. It weighs less than 8 oz, measures 5.45 x 3.90 x 0.90 in., and does not require a costly power supply. The complete system includes a NIST-traceable calibrated light source, a cosine corrector, optical fiber, and operating software. Applications include emissions analysis and plasma analysis.

Mass-Flow Controller

EMCO

Longmont, CO

The Mach-One mass-flow controller maintains reading accuracy of ±0.5% over a 100:1 turndown range, measuring flows as low as 0.4 std cm³/min and as high as 1000 std cm³/min. Accuracy can be expected to remain stable within 0.25% per year, minimizing downtime for recalibration and servicing. With a simple mechanical design and an operational basis in sonic flow technology, the controller permits flow capacity to be adjusted by increasing or decreasing supply pressure. The device requires no flow bypass and eliminates overshoot or undershoot of the set point. Its large nozzle area reduces the likelihood of clogging. Response time is typically 100 milliseconds. Supply pressure can be set to a subatmospheric level to reduce pressure drop and remove the possibility of external leakage.

Contact-Angle Measuring Systems

AST Products

A line of video contact-angle surface analysis systems integrates a high-resolution video computer imaging system with advanced mechanics and a precise microsyringe liquid-dispensing system. Each VCA Optima system provides quantitative, user-independent surface-characterization information rapidly; results and real-time static or dynamic images can be viewed, charted, stored, and printed. Measurement accuracy for the contact angle is within 0.1° and accuracy for surface tension is within 0.5 dyn/cm. Standard system hardware includes solid-state lighting, a high-end PC with high-performance video board, a three-axis-adjustable stage, and a unitary control box, A motorized syringe is included in the most sophisticated of the three models.

CVD Metrology System

Nova Measuring Instruments

Rehovoth, Israel

The NovaScan 840D integrated thickness monitoring system for CVD processes is based on the manufacturer's CMP systems. The system measures dielectrics, antireflective coatings, and barrier layers in the CVD process without impairing CVD tool throughput or increasing equipment footprint. The system enables closed-loop control to reduce process variations, provides real-time metrology data to minimize out-of-spec losses, and is designed to reduce the cycle time associated with metrology. Complete production-line integration and automation of the measurement process free line operators for other activities.

Averaging Controller

Maxtek

Torrance, CA

By averaging readings from as many as six crystal sensors to account for changes in vapor distribution, the MDC-370 averaging controller helps optimize thin-film deposition. The easy-to-use controller has large LED displays for key run-time values and a graphic LCD that indicates rate, rate deviation, thickness, deposit power, and other process information. The device provides automatic sensor/crystal switching; up to six source outputs; a standard RS-232 interface; as many as 16 programmable inputs and outputs to perform such tasks as pocket and crystal selection; and storage for 99 processes, 999 layers, and 32 materials.

Cylinder-Pressure Regulator

Sensiflo

Colton, CA

The SCYL-series single-stage pressure-reducing cylinder regulator is designed for use with liquids or gases. The regulator can handle inlet pressure up to 3600 psig and features control ranges of 0 to 10, 25, 50, 100, 250, 500, or 750 psig. The supply pressure effect is 0.5 psig/100 psig, and the designed leakage rate for helium is <1 x 10^­9 std cm³/sec. Constructed of Type 316L stainless steel, chrome-plated brass, Monel, Hastelloy, or titanium as requested, the regulator has an operating temperature range of ­45° to 575°F. Applications besides cylinder regulation include component testing, slow gas-purge control, and tank pressurization.

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