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CONFERENCE PROGRAMS CONTINUED

Novel Technologies

 

RF - MEMS

Alain Le Roy, LETI

 

Automotive MEMS

Robert Aigner, Siemens

 

Biomedical MEMS

Reiner Wechsung, Steag Microparts

 

Assembly, Testing

Heinrich Walk, ASYS

 

ModulAS--A Modular Assembly System
for the High-Speed, High-Precision Assembly of Multiple Microsystems

Johann Peter Feraric, Simotech

 

9 a.m.­5 p.m.

Advances in Chemical Mechanical Polishing
(CMP) Technology Course

Instructors: Dale Hetherington and David Stein,
Sandia National Labs; Joost Grillaert, IMEC; and Katia Devriendt, IMEC

Guest Speaker: Mike Ravkin, Manager of CMP and
Cleaning Technology Development, Lam Research

1­5 p.m.

Semiconductor Equipment Assessment (SEA)

Chair: Georg Kelm, European Commission

 

SEA--Strategic Partnerships Providing Productive

Solutions

Jeff Bruchez, SEA/SiTeC

 

Performance of a Twin Furnace System in
a 300-mm Production Environment

Sonja Radler, SC300

 

Automated 300-mm Test/Monitor Wafer
Logistics in a Production Batch Environment for Integrated Yield and Process Control

Jürgen Griessing, Infineon

 

Cost-Effective Removal of Particulate and
Metallic Contamination from Wafer Containment Systems Using a
200-300-mm Bridging Tool

Pascal Decamps, STMicroelectronics

 

Status of 193-nm Technology

Kurt Ronse, IMEC

 

Automated, 300-mm Compatible, Wafer
Analysis Preparation System with Integrated VPD-Droplet Collection

Stefan De Gendt, IMEC

 

Extending High Accuracy Analytical
Probing to 300-mm Wafers

Jürgen Frickinger, FhG IIS-B

 

STEP: SEMI E78 : Electrostatic Compatibility of Equipment

Chair: Arnold Steinman, Ion Systems, ESD/ESC
Task Force Leader, SEMI International Standards Program

 

Introduction: The Basics: Static Charge
Problems, Electrostatics, Measurement Techniques and Static Control Methods

Arnold Steinman, Ion Systems

 

ESD Damage to Components

Minimizing Electrostatic Attraction of Contamination

 

ESD Effects on Equipment

Implementing SEMI E78-0998, User/Manufacturer Collaboration to Achieve the Static Levels in the Guide

Arnold Steinman, Ion Systems

 

International Workshop on
Lead- and Halide-free Electronics

Chairs: Ruben Bergman, Executive Director of HDP User Group International; and Professor Suganuma, Osaka University

 

6:30­10 p.m.

Semicon Europa Opening Reception and President's Dinner

New Munich Trade Fair Center, Room 14

 

WEDNESDAY, APRIL 5

8:30­10:45 a.m.

Semiconductor Equipment and Materials Market Briefing Forum

Speakers: Elizabeth Schumann,
Materials Statistics Programs, SEMI; and John Schuler, Equipment Statistics Programs, SEMI

 

8:30 a.m.­12:30 p.m.

Lithography for 120 nm and beyond

Chair: Gerhard Gross, International Sematech

Cochair: Uwe Behringer, Institute for Microstructure Technology (FZK)

 

Introduction

Gerhard Gross, International Sematech

 

How Far Can Optical Lithography Go?

Luc van der Hove, IMEC

 

Next-Generation Lithography

John Canning, International Sematech

 

Next Challenges for Exposure Tool Suppliers

Bill Arnold, ASML; Phillip M. Ware, Canon; Speaker TBA, Nikon; and John J. Shamaly, SVGL

 

Next-Generation Dielectrics

Chair: Ivo Raaijmakers, ASM International

 

Welcome and Introduction

Ivo Raaijmakers, ASM International

 

Keynote

High-k Dielectrics for DRAMs

Gurtej Sandhu, Micron Technology

 

High-k for CMOS: From Furnace to CVD in Advanced CMOS Technology

Edward W.A.Young, Philips Research Labs

 

RTP for Advanced Dielectrics

Jeff Gelpey, Rahul Sharangpani, and Georg Roters,

 

Steag RTP

 

Atomic Layer Chemical Vapor Deposition
of High-k Gate Dielectrics

Suvi Haukka and Marko Tuominen,
ASM Microchemistry; and Ernst Granneman,

ASM International

 

Electrical Properties of Metal-Insulator-Semiconductor Devices with High Permittivity

Gate Dielectric Layers

 

M. Houssa, M.M. Heyns, M. Naili, and P.W.

Mertens, IMEC; and A. Stesmans, Dept. of

Physics, KU Leuven, Belgium

 

8:30 a.m.­5 p.m.

Environment, Health, and Safety (EHS) Compliance Market Driven and Legal Requirements (cosponsored by SSA Europe)

Chairs: Peter Middleton, Filtronics; and Alastair Brown, Rushbrook Consultants

 

Morning Session

 

Introduction

Peter Middleton, Filtronics

 

Explosive Atmospheres

Clive Patten, ITS

Pressure Equipment Directive

Speaker TBA

 

Electronic Waste

James Donaldson, Waste Exchange Services

SEMICON
EUROPA
EXHIBITOR
LIST G-L

 

G

G&N A1.639

Gaflo Pumpen A3.642a

Gaiser Tool A3.165c

Garlock Cefilac A4.205

Garnet A1.210s, A1.222s, A1.310s

GaSonics A1.242

GCE Druva A1.107a

GE Quartz A3.442

Gel-Pak A1.210t, A1.222t, A1.310t

Gemetec A4.124

GEMÜ A3.476

Gencoa A4.427a

General Precision A4.154

Genmark Automation A2.284

Genus A1.454

Georg Fischer Piping Systems A3.264

GGB Industries A2.622c

GL Mechatronic A4.137d

Glas-Col A1.210u, A1.222u, A1.310u

Gold Tech Industries A1.137

Graham Optical A3.506e

Granville-Phillips A1.622b

Greene, Tweed A1.746

GSI Lumonics A2.384

GW Associates A2.501c, A3.743

 

H

Habonim Industrial Valves A3.668

Haldor Topsoe A2.444a

Hale Hamilton A4.127a, A4.127b

Hamamatsu Photonics A1.720

Ham-Let A1.262c, A2.324c

Handy & Harman A2.716

Han-Mi A2.622d

Hartfelt A2.754d

Hastings Instruments,
Teledyne Electronic Tech.
A4.102c

HCT Shaping Systems A1.125

Heidelberg Instruments A1.163

Dr. Johannes Heidenhain A2.134

Helix A1.622

W.C. Heraeus, Heraeus Quartzglas A1.162

Hesse & Knipps A4.342

HH A2.716a, A2.716b

Hillelian Concepts A3.615

Hitachi A3.444

Hiwin A4.412

HM Reinraum-Technik A4.224

Honda Electronics A3.725a

Honeywell Electronic Materials A1.122

Horiba A3.644

Hositrad A3.618

Hoya A1.542

H-Square A2.664a, A2.668a

HTT--High Tech Trade A2.137, A2.144, A2.144-2a

Hüttinger Elektronik A1.549

HVA A1.538

Hypervision A2.521

Hytec Flow Systems A1.384n

 

I

Ibis Technology A1.637

IBS--Ion Beam Services A2.545

ICD-Heateflex A2.664b, A2.668b

ICOS Vision Systems A3.785

ICT A2.322b

IDI--Interconnect Devices A2.334b

IGC-APD Cryogenics A3.352

IHP A4.210

Impac Electronic A4.311

Imtec Acculine A1.384a, A1.385

IN A3.724

Inabata A2.718

Incam Solutions A2.763b

Infineon Technologies A4.144c

Inko Industrial A1.279b

Innolas A4.448

Innotec Group A3.603

Inrem Ab A1.131g

Inspectech A2.144-1j, A2.161

Inspex A1.720a

Integrated Designs A1.142c

Integrated Dynamics Engineering A4.442

Integrated Measurement Systems A2.308

Integrated Technology A2.124d

International Test Solutions A2.137p, A2.144p, A2.144-1k

Intersurface Dynamics A2.754c

Intertek Testing Services A2.477a

Intest A2.522

Invax A3.779b

Ion Systems A1.628

Ion Tech A1.244c

Ionics A2.748

IPC Fab Automation A4.251

Irvine Optical A1.544d

Ishii Tool & Engineering A3.417

Ismeca A1.141

Isonics A3.700a

Itochu Systech A4.342a

ITS A1.544

Iwaki A3.714

 

J

JEM A2.602

JEOL A3.524

JIPELEC A2.168

JMC A2.123

Jobin Yvon A3.644e, A3.644g

Johnstech A2.137q, A2.144q, A2.144-1l

JSR Electronics A3.544

Just Vakuumtechnik A4.427

 

K

K&S Semitec A3.242c

K&W A2.137t, A2.144t

Kakizaki A1.344c, A1.726c

Kanken Techno A1.180f

Kayex A1.180c

Keithley A1.342

Kimberley-Clark A1.210v, A1.222v, A1.310v

Kinetic Systems A2.322c

Kinetics A3.564

Kitec A2.167

KLA-Tencor A1.442

Klee A1.577e

Kobe Precision A1.279c, A4.406

Koch Microelectronic Service A3.109

Kokusai Electric A2.450, A2.454

Komatsu A1.210w, A1.222w, A1.310w, A3.725b

Koyo A1.178, A1.180a

Krantz-TKT A4.424-1

Kratos Analytical A1.653a

Kremin, a subsidiary of JSC A3.712

Kristiloehn A1.180d

Krytek A1.210x, A1.222x, A1.310x

KSI A2.137r, A2.144r, A2.144-1m

KTC A2.137s, A2.144s

Kulicke & Soffa A3.242, A4.310a

John P. Kummer A1.510

Kyocera Fineceramics A2.708

Kytek A1.107b

 

L

Laflow Reinraumtechnik A2.184a

Lambda A1.262g, A2.324g

Lambda Physik A2.352

Laporte Electronics A3.462

Laser Technology West A4.102a

Lasertec A1.510e

Lauffer Maschinenfabrik A2.471

Laurell Technologies A2.664e, A2.668e

Laurier A3.284c, A3.384c

Legacy Systems A1.544f

Lehighton Electronics A2.167c

Leica Microsystems A1.642

Leo Elektronenmikroskopie A4.384

Leybold Inficon A1.364, A1.465, A1.532

LG International A1.284

Lindberg Blue-M A2.137u, A2.144u

Linde Industrial Gases Div. A4.202

Lintec A1.102a

Litel Semiconductor Instruments A1.544h

Litmas A2.554b

Lixi A2.137v, A2.144v

Loemat Industrievertretung A4.144g

Longhill A2.144-1n

Loranger International A2.617

Lorex Industries A1.142d

LPE A2.362

Lucas/Signatone A2.302

Lucid A2.484a

Ludl Electronic Products A1.278

Lufran A1.478

Lufthansa A4.424-1a

Lutch-Ceramics Science &
Technology Complex
A3.502

Luwa, a div. of Zellweger Luwa A3.554

Luxtron A3.506c

Luxtron/Accufiber A3.284d, A3.384d

Lymtech Scientific A1.210y, A1.222y, A1.310y

 

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