Surface-Conditioning Systems

FSI International

Chaska, MN

A series of surface-conditioning units provide BEOL postash, damascene copper, and low-k cleaning for advanced technology nodes. The ZETA 200BE and 300BE are compatible with a range of semiaqueous solvents, solvents, and other chemistries, and possess a sealed nitrogen-purged process environment. A rapid solvent-to-rinse transition eliminates corrosion and the need for an isopropyl alcohol intermediate rinse. The small-footprint units are available fully automated for 200- and 300-mm manufacturing or as a 200-mm semiautomated unit.

Miniweld and Face-Seal Fittings

Surelock

Ontario, CA

Assorted miniweld and face-seal fittings are available in various materials, including Type 316L stainless steel, Vim-Var, and C-22. These fittings have a clean, smooth surface finish and include various types of glands, elbows, tees, crosses, bulkhead unions, nuts, and gaskets. The standard finish is 10 Ra or less, and a surface finish of less than 5 Ra with or without electropolish is also offered.

300-mm Wafer Carrier

Engineering Plastics

Westboro, MA

A 300-mm wafer carrier features a detachable handle and fits inside dry transport systems to minimize handling. The carrier is molded and machined from polytetrafluoroethylene resin and exhibits virtually no degradation from harsh chemicals such as aqua regia, sulfuric acid, hydrochloric acid, and ammonia. The seamless one-piece carrier is free of microvoids and porosity and has no pins, screws, or dovetails that can loosen or trap contaminants.

300-mm Sorters

Brooks Automation

Chelmsford, MA

The MapTrak Express series of 300-mm sorters are configurable for two and four BOLTS load ports. These units can handle FOUPs, FOSBs, and reduced-pitch FOSBs. The sorters can be programmed to support 200-mm SMIF pods and cassettes. A user-friendly interface and AMHS communications software are incorporated into the units. Options include a choice of filter systems, character reading systems, macro inspection, stocker integration, language interfaces, and loadport configurations. Additional options include minienvironment features such as pressure and airflow control.

Laser Spectroscopic Ellipsometer

Rudolph Technologies

Flanders, NJ

A laser spectroscopic ellipsometer has a modular platform, a multiwavelength high-resolution mode, and a new small-spot, high-repeatability mode that has a 5 x 10-µm measurement spot size. These attributes enable repeatable measurements of ultrathin gate oxides, including oxide-nitride-oxide stacks and nonnitrided silicon dioxide under a polysilicon gate. The S200/300-ultra incorporates modeling algorithms that provide the ability to monitor, develop, and control organic low-k and ultralow-k interlevel dielectric materials.

Diagnostic, Monitoring Software

Cymer

San Diego. CA

Lithography light source­specific software provides remote analysis and support of the company's installed base of 5000-, 6000-, and 7000-series excimer laser light sources. CymerOnLine can be accessed with zero downtime, from any location, and at any time. The e-diagnostic and performance-monitoring software can track parameters such as bandwidth, energy sigma, short error sum, injection cycle, F2 consumption, temperature, pressure, and voltage on a near real-time basis via statistical process control. The software is designed to anticipate and schedule maintenance downtime. The software's features include a user-friendly interface and a secure data environment.

Data-Acquisition Module

Simon Technology Systems

San Clemente, CA

The SiLink data-acquisition module and the serial/local operating networks (LON) gateway module manage critical process variables. Using the embedded LONTalk protocol, these modules provide a scalable, open architecture for monitoring sensors and equipment, implementing control loops, managing network traffic, and facilitating remote diagnostics. The modules come packaged as stand-alone devices or as an embedded system for adding distributed intelligence and communication capabilities to OEM products. In addition, these modules can be combined with the company's Windows NT facilities-monitoring software to be used as a turnkey equipment/facilities management system.

Multichambered Cluster Tool

Trikon Technologies

Newport, UK

A multichambered cluster tool combines plasma etching sources with a wafer handler and the platform used for the company's deposition units. The Omega fxP features Windows NT control software, advanced electrostatic chucks, and a small footprint. The tool offers up to six process modules, wafer alignment, and cooldown capacity with two vacuum cassette stations.

Vapor-Sublimation Trap

MKS Instruments

Boulder

A vapor-sublimation trap removes contaminants from the vacuum process. The new model has heaters at the inlet, preventing clogging. The trap catches ammonium chloride by-products that are generated in the low-pressure chemical vapor deposition silicon nitride process. The two-stage design traps effluent by-products in the first stage and particulates in the second stage. Trapping these contaminants reduces the chance that by-products will stream back into the reaction chamber and contaminate the system, thereby increasing pump yield. The trap also collects by-products before they contaminate the vacuum pump, lengthening pump life.

High-Temperature-Resistant Valves

George Fischer

Tustin, CA

The Type 315 diaphragm valve and the Type 319 zero-static valve are constructed of polyvinylidene fluoride (PVDF) and include a secondary FPM O-ring. Physical properties include abrasion resistance, impact strength, chemical resistance, low water absorption, and a wide operating temperature range. The Type 315 is designed for flow control applications and is available in sizes that range from 20 to 63 mm. In addition, a snap-on handwheel, an optional lock, and a position indicator are offered. The Type 319 is suitable for eliminating dead legs in ultrapure-water systems and is available in 34 sizes, ranging from 20 x 20 mm to 110 x 63 mm.

Plasma Etching Tool

Tegal

Petaluma, CA

A plasma etching tool developed for giant magnetoresistive/tunneling magnetoresistive read-write head and magnetic RAM device fabrication features dual-frequency technology in an inductively coupled plasma (ICP) source. The 6550 Spectra is designed to etch feature sizes £0.18 µm. The dual-chamber platform offers a rinse-strip-rinse process capability, which helps to eliminate postetch corrosion in ferromagnetic materials.

Dissolved-Ozone Sensor

IN USA

Needham, MA

The dFFOZ-LF dissolved-ozone analyzer is designed for low flow rates that are below 1 L/min. The plug-in sensor can measure dissolved ozone in DI water and other liquids in concentrations from 0 to 150 mg/L and can operate directly at a wide range of line pressures and temperatures. The on-board calibration data and dual-optical-path sample-sensing technology eliminate the need for a reference gas measurement. The sensor is cleanroom ready for high-priority semiconductor processes and can be installed in a full-flow recirculating stream.

Cleanroom Glove

North Safety Products

Cranston, RI

The 3-D Ultrapoly is a heat-sealed glove suitable for silicon-crystal growing and processing, wafer fabrication, and other cleanroom applications. The glove is contoured in three dimensions, providing comfort and fit. An inset thumb eliminates film bunching in the palm of the glove. The glove is constructed of 100% ultrapure polyethylene and is manufactured and packaged in a cleanroom. Particle counts are consistently <250 particles/cm². The glove's 15-in. length offers added protection. It is available in three sizes.

Photomask Pattern Generator

Micronic Laser Systems

Täby, Sweden

The Sigma 7100 is capable of writing photomasks at the 100-nm technology node. The laser pattern generator uses a spatial light modulator (SLM) as a programmable mask. The SLM is an integrated circuit with a flat, mirrorlike surface located within the tool. Deep ultraviolet light is reflected off the surface of the SLM to expose a photoresist on a photomask blank on the tool's stage, forming the pattern of the mask.

Vibration Isolation Legs

Rodel

Phoenix, AZ

Vistek VIL 200-series vibration isolation legs reduce by 50­98% the transmission of vibrations to the floor from equipment such as CMP tools. Vibration sources equipped with these components can be placed directly on the fab floor, eliminating the need for tool pedestals. The passive mechanical vibration control device incorporates white vibration filtering technology. This technology allows for a broadband suppression of input vibration frequencies to a low constant amplitude and delivers from 1- to 3-Hz isolation in precision manufacturing and metrology tools.

Nirlat

Nirlat

Nir-oz, Israel

The Hi-tac 900 is a water-based acrylic sealant designed for cleanrooms and sterilized areas. The sealant has <10 ppm of organic outgassing compounds. It adheres to aluminum, glass, polycarbonate, unplasticized polyvinyl chloride, foamed plastics, concrete, and porous and wet substrates. The sealant can be painted and has long-lasting flexibility.

Single-Wafer Cleaning System

Verteq

Santa Ana, CA

A single-wafer-cleaning unit is designed for postetch, predeposition, and via cleans for 70- to 150-nm geometries on either 200- or 300-mm wafers. The Goldfinger Mach 1 houses a single process chamber and features megasonic on-demand injection from single or multiple chemistry sources, independent top and bottom process control, and an integrated surface tension gradient drying process. The enclosure is 23 sq ft and can be bay-and-chase or ballroom installed. Included is an E.15-compliant loadport, which, along with the unit's robotics, can be fitted for 200-mm cassette, 200-mm SMIF, or 300-mm FOUP use.

200-mm Wafer Prober

Electroglas

San Jose, CA

A 200-mm-wafer prober is suitable for ultrasensitive dc parametric testing in front-end wafer processing and advanced RF communications wafer products testing. The EG4|200e features tuned cables, magnetic isolation, a low-noise guarded chuck, and a low-noise mechanical design. The low system noise, leakage, and capacitance shorten measurement settling times. A Windows NT operating system provides process monitoring and control through the host system or the Internet.

Ceiling Sprinkler

FlexHead Industries

Acton, MA

A cleanroom ceiling sprinkler offers fire and contamination protection. The stainless-steel construction does not generate particulates or other contaminants. The unit comes with a flexible hose connected to a sprinkler drop with a grid attachment and a choice of sprinkler heads. The design dissipates vibration, preventing damage to gel seals. The FlexValue is pressure tested and guaranteed to be leakproof. It does not require painting or epoxy coating. The one-piece unit can be installed in about 10 minutes.

Vacuum Pump

Ulvac Technologies

Methuen, MA

The Drymac PDR-C vacuum pump is suitable for CVD and etching applications. The lightweight aluminum casing and rotor provide energy efficiency and uniform operating temperatures throughout the six Roots stages. The entire unit is coated in Tufram for enhanced resistance to chemical corrosion and wear. The vacuum pump uses a canned motor for leak tightness and is equipped with a microcomputer control system that monitors pump status and alarms via RS-232-C and a handheld controller. The pump is available as 47-, 74-, and 139-cu ft/min models. Versions are also available with integrated booster pumps for pumping speeds of 200, 400, and 600 cu ft/min. Configurations include cool, high, and ultrahigh pump operating temperature models. Utilities such as shaft seal purge gas, ballast gas, and cooling water are fully adjustable and can be regulated directly at the pump.

Airborne-Contaminant Monitor

Molecular Analytics

Sparks, MD

A molecular-contamination monitor has an internal calibration system based on permeation devices for compounds of interest. The AirSentry II checks for photochemical organic contaminants and silicone/siloxane contaminants, both of which can deposit on optical lens surfaces and reduce laser throughput at 157 and 193 nm. Rotary sampling valves are mounted within the unit, allowing multipoint sampling from 16, 30, or 45 sample points.

Sierra Instruments

Monterey, CA

A mass-flow controller features a stainless-steel flow body and is suitable for clean gas-flow applications. The internal location of the sensor makes it virtually clog-free, and access ports at both ends of the sensor facilitate cleaning. The on-board LCD and local set-point potentiometer allow for the adjustment of the command signal from the face of the instrument enclosure, simplifying the flow control of corrosive and toxic gases. The 810S Mass-Trak offers a switch-selectable remote set-point capability that can be easily interfaced with a process control system or workstation. The controller provides two simultaneous output signals and a single-sided 24-V dc power input that eliminates the need for dual-polarity power supplies. The instrument's packless and frictionless control valve features both a purge mode and a valve-close command from an external contact. It has one moving part and operates from 8 to 50 psid.

Antireflective Coatings

Brewer Science

Rolla, MO

The i-CON series of antireflective coatings is designed for use in i-line (365-nm) photolithography processing. Employing antireflective coatings improves critical dimension control and expands process capability. The i-CON coating is a highly conformal product that can be used on topographies as high as 7000 Å. It combines high conformality and fast etch rates to satisfy coverage issues and prevent overetching. Etch rates with the coating are approximately 30% faster than most advanced i-line photoresists.

Bare/Filmed Wafer Inspection

Topcon

Tokyo, Japan

The WM-3000F bare/filmed wafer defect inspection system performs rotation-based inspection of 200- and 300-mm unpatterned wafers. With up to five open cassette stations and FOUP or SMIF loadports, the system sorts wafers according to the amount of specified defects or haze they contain. With sensitivity of 55 nm and better, the tool can be optionally equipped with pure edge-grip handling, which allows backside inspection of double-sided polished wafers without additional loading. The system's simultaneous multiple-laser-beam capacity features a sensitive and repeatable COP-LPD microscratch separation method in ultrawide size ranges from 0.073­5.0 µm in one run.

MicroHome | Search | Current Issue | MicroArchives
Buyers Guide | Media Kit