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MicroMagazine.com

The votes are in! MICRO's readers have selected the 30 most popular products from among the nearly 200 that appeared in the magazine's Product Technology News section throughout 2001. This year's Top 30 All-Stars range from analysis instruments and CMP tools to wafer markers and gears. The list includes cleanroom doors, face-seal fittings, metrology stations, microfilters, liquid flow sensors, ion implanters, tubing pumps, defect inspection tools, pressure transducers, PVD systems, wafer sorters, pressure control monitors, and 300-mm etch tools. MICRO extends a hearty congratulations to the winners!

ADE
Applied Materials
Axcelis Technologies
Barnant
Celgard
Continental Fan Manufacturing
Dynaco
ECI Technology
FEI
Gems Sensors
George Fischer
Lam Research
Lucid Treatment Systems
Malvern

McMillan

MGI Electronics
Meissner Filtration Products
Micronic Laser Systems
Micropump
Minco Products
Mitutoyo
NetMotion
Parker Seal Grou.p
Peter Wolters
Rofin-Baasel
Rush Gears
Saint-Gobain Performance Plastics
SigmaTech
Surelock
Tiger Optics



Defect Inspection Tool

FEI

Hillsboro, OR

The fully automated Expida dual-beam structural diagnostics tool performs in-fab characterization and analysis of process excursions and defects. The instrument can be reconfigured from 200- to 300-mm wafer manufacturing with minimal interruption. The tool allows users to cut, view, measure, analyze, and modify the structures of ICs during all aspects of manufacturing.


Perfluorinated Elastomers

Parker Seal Group

Irvine, CA

Parofluor high-performance perfluorinated elastomers for use in semiconductor fabs provide long seal life in harsh environments and are manufactured in an ultra-high-purity production area to minimize contamination. Ultra-series materials include compounds offering distinctive physical properties and different performance capabilities. Resistant to steam, water, and a wide variety of chemicals, the materials can be formed into O-rings, molded shapes, slit-valve door seals, and other configurations. They retain their sealing ability after continuous exposure to temperatures £320°C in one formulation. A choice of black, white, and translucent materials is offered.


Particle Size and Shape Analyzer

Malvern

Southborough, MA

The Sysmex FPIA-2100 is a fully automated particle size and shape analyzer that delivers size and shape distribution data and, using a CCD camera, produces images of each particle as well as a scattergram of shape index versus particle size. Samples pass through a sheath flow cell, which transforms the particle suspension into a narrow or flat flow, ensuring the largest area is oriented toward the camera and that all particles are in focus. A CCD microscope illuminated by strobe captures particle images every 1/30 second. The system can measure particles from 0.7 to 160 µm in size. The numerical evaluation of shape is derived from measuring the area of the particle.


Ion Implanter

Axcelis Technologies

Beverly, MA

The MC3 medium-current ion implantation system for 300-mm semiconductor manufacturing is designed to meet both existing and future manufacturing requirements. The fully automated serial processing implanter has evolved from the existing 8250HT 200-mm technology platform. The implanter's angular energy filter maintains a high level of beam purity over the range of 5­750 keV, and it has the ability to process indium and other species on the same system. The system's constant-focal-length wafer-scanning capability keeps the focal point of the ion beam equidistant from all points on the wafer regardless of tilt angle. This feature maintains uniformity and beam parallelism suited to high-tilt implants. A multitasking control feature facilitates editing of recipes, access to data, and communication with factory host systems without any impact on the production environment.


CMP Unit

Peter Wolters

Rendsburg, Germany

A CMP unit for 300-mm wafer processing features automatic process control, automatic wafer rework, low-stress dry-in/dry-out wafer processing, and remote system control and maintenance. The PM300 Apollo's post-CMP cleaning process includes brush scrubbing, chemical cleaning, and spin drying. Up to three subsequent and independent process steps can be run on this tool. The unit is suitable for multistep metal and oxide CMP, and provides end-point detection and closed-loop control. The unit is controlled via a PC with a touch screen monitor. The PC runs on Windows NT with an Ethernet interface.


Wafer Sorter

MGI Electronics

Tempe, AZ

The New Phoenix V6 wafer sorter is a multifunctional stand-alone system that sorts wafers and performs 25 or 50 bulk transfers and 25- or 50-wafer randomization in approximately 4 minutes. The system easily interfaces with many cleanroom zones, such as diffusion areas for wafer tracking and test, probe, and metals areas for sorting, splitting, and compressing lots back to their original carriers. The system is SEMI S2-93 and SEMI S8-95 compliant and can be controlled remotely via an RS-232 data communication port.


Ultrapure Regulator

Saint-Gobain Performance Plastics

Garden Grove, CA

The Furon UPRP precision regulator delivers aggressive pure chemicals and DI water precisely while maintaining downstream pressure to a predetermined set level. The component is used wherever fluid system delivery requires high purity. It is available in either a manually actuated or pneumatically actuated version. It handles fluid temperatures up to 194°F and is made of all-virgin PTFE/Fluoroloy T and PFA wetted flow paths. It features a PTFE isolation bellows that protects system chemistry and, in the pneumatically actuated version, a secondary diaphragm that protects the compressed air system. An optional integral leak detection port is also available. All external surfaces are nonmetallic.


Cleanroom Roll-Up Door

Dynaco

Northbrook, IL

A supercompact cleanroom roll-up door is suitable for research and process settings. Offering high levels of cleanliness, air control, and sealing to limit leak flow, the door has advantages over swinging doors, sliding doors, and strip curtains. Maximum door size is 18 x18 ft. The unit's fast opening rate of 4 ft/sec and closing rate of 2 ft/sec reduces the time the cleanroom interior is exposed. The door is suitable for Class 100,000 to Class 10,000 applications. It has a soft curtain to ensure the safety of personnel and product. A self-fixing feature eliminates the need for repairs and protects the environment from cross-contamination. Impact to the door separates the curtain from its guides. Simply rolling the door up or down using a remote actuator refeeds the curtain into the guides.


Temperature/Humidity Data Logger

Barnant

Barrington, IL

A temperature/humidity data logger records and retains up to 1000 readings, with date and time for each. The HumidityLogR measures RH, temperature, and dew point and displays all three parameters on an easy-to-read LCD. The unit, which measures 3.3 x 6.2 x 1.3 in., has push-button storage/recall, a °C/°F option, minimum/maximum readings, and a hold button to freeze readings. It can send all data to an infrared printer. A separate infrared interface allows for the downloading of all information for storage and analysis. The instrument's ABS housing and sealed keypad provide splash-proof protection. Its operating temperature range is from ­40° to 140°F (­40° to 60°C) with resolution to 0.1°. The RH range is 0­100% with 0.1% resolution.


Hollow-Fiber Membrane

Celgard

Charlotte, NC

A high-pressure, hollow-fiber membrane is used for transferring gases to and from liquid streams. The X50 fiber membrane is made from thick-walled, microporous, hydrophobic polypropylene, which allows excellent CO2 removal from liquids. (Removing CO2 from ion-exchange beds helps reduce chemical use and improves outlet water quality.) Gas diffuses from the liquid stream on the outside of the hollow fiber to the gas stream on the inside. The hydrophobic properties of the material keep the liquid phase from penetrating the pores of the membrane wall. The robust fiber can withstand pressures up to 120 psi. This high pressure rating enables the user to avoid having to repressurize the liquid after CO2 removal.


Miniweld and Face-Seal Fittings

Surelock

Ontario, CA

Assorted miniweld and face-seal fittings are available in various materials, including Type 316L stainless steel, Vim-Var, and C-22. These fittings have a clean, smooth surface finish and include various types of glands, elbows, tees, crosses, bulkhead unions, nuts, and gaskets. The standard finish is 10 Ra or less, and a surface finish of less than 5 Ra with or without electropolish is also offered.


Microfilters

Meissner Filtration Products

Camarillo, CA

A series of microfilters is suitable for the filtration of etch baths, acids, bases, solvents, and metal and oxide CMP slurries. Available configurations include minicartridges for low-flow applications; capsule filters; 10-, 20-, 30-, and 40-in. cartridges; and 10-, 20-, and 30-in. encapsulated filter assemblies. Filtration media offered include polypropylene microfiber and polypropylene, polyethersulfone, and PTFE membranes. Absolute filtration ratings range from 0.04 to 70 µm.


PVD System

Applied Materials

Santa Clara, CA

Self-ionized plasma (SIP) PVD technology is available on the Endura and Endura SL metal-deposition platforms. The SIP technology deposits critical barrier/seed films in copper-based interconnects and liner/barrier layers in aluminum structures. It extends PVD technology into the 100-nm range by delivering conformal film coverage that matches the requirements for lining high-aspect-ratio interconnect structures. The system's process chamber includes a magnetron plasma source that maximizes ionization of the metal atoms in the chamber, thereby providing strong step coverage in small-geometry structures. Throughputs of 70 wafers per hour are possible. An integrated high-vacuum sequence is used with copper-based devices to line the interconnect structure with SIP tantalum/tantalum nitride and copper seed layers. For aluminum-based interconnect applications, SIP technology is used to deposit titanium as an underlayer in an aluminum slab/interconnect stack structure. It also can deposit titanium and titanium nitride liner/barrier films in contact and via structures.


Heated Chucks

Minco Products

Minneapolis, MN

Thermofoil heated chucks for semiconductor processing equipment are lightweight, compact components for lithography, CVD, PVD, dry etch, and stripping processes. Available in 200- and 300-mm sizes, the chucks improve temperature uniformity. Design options include polyimide-insulated heaters bonded to aluminum chucks (to 260°C), mica-insulated heaters sealed into welded chucks (to 500°C), and mica-insulated heaters clamped between silicone carbide plates (to 600°C). Other options include profiled power for uniform temperature and integral sensors for accurate control. The company offers services for finite element analysis and thermal imaging to optimize thermal performance.


Wafer-Analysis Software

ADE

Westwood, MA

A software application analyzes production-related defect problems and monitors process variations using advanced trend identification. Performing timely examinations, Wafer Analyzer 2.2 with camLine SPC software offers real-time process control of functions such as inspection-tool control. The SPC portion of the application executes distributional analyses and allows advanced setup for control charts.


Motorized Impeller

Continental Fan Manufacturing

Buffalo, NY

An airfoil impeller with an enclosed ball-bearing motor exhibits good sound characteristics and performance. Used in plenums for cleanroom air, the TMK motorized impeller has an external rotor motor mounted inside that optimizes space and allows for optimal cooling. The motors are industrial duty, completely enclosed, and 100% speed controllable. A balanced assembly provides smooth, vibration-free operation. Five sizes are available from 11 to 17.7 in. in diameter. Flows are provided to 5000 cu ft/min, and pressures are provided to 41/2 in. water gauge. Standard single- and three-phase voltages are available, with optional capacitor and speed control.


Pressure Control/Flow Monitors

Lucid Treatment Systems

Hollister, CA

The Clarity line of pressure control and flow monitors offers process engineers options for programmable real-time control of bulk chemical and slurry distribution. The PLC-regulated fluid-dynamics control systems provide simple connectivity and flexibility. The first wet-process peripheral in the series, the Clarity LPC controls pressure by regulating the amount of fluid flowing from a bulk delivery loop and returning to a day tank. A pressure sensor measures distribution loop pressure against a set point in less than 50 milliseconds and responds to fluctuations by adjusting a high-purity control valve. The system comes in three models and two flow ranges.


Wafer-Handling Tweezers

NetMotion

Fremont, CA

Nonmetallic lockable tweezers feature a locking lever for high reliability in 6-in. wafer handling. The M100-150L is optically polished in specific areas so that a wafer can be firmly handled with minimal contact and scratching. The tweezers are offered in several thermoplastic materials that are selected for temperature and chemical resistance, including virgin polyetheretherketone (PEEK), conductive PEEK for ESD protection, and polyphenylene sulfide.


Corrosive-Liquid Flow Sensors

McMillan

Georgetown, TX

A series of sensors can measure flow rates from 15 ml/min to 50 L/min with a ±1% accuracy and an approximate response time of 1 second. Series 106 flow sensors are used primarily in semiconductor liquid-flow applications, in which particle-free operation and high purity are essential. The components measure DI water and most corrosive liquids accurately. The series is expected to replace conventional glass-tube and ballflow meters in many applications because of its Teflon and sapphire wetted surfaces. In addition, the flow sensors have low power requirements, standard optoisolated pulse output, and a fast-response micro-Pelton wheel that determines the liquid flow rate.


Moisture Analyzer

Tiger Optics

Warrington, PA

The MTO-1000-H2O moisture analyzer couples continuous-wave laser technology with cavity ring-down spectroscopy to measure moisture in inert, reactive, and corrosive semiconductor gases. The analyzer has a measurement range of 0 to 5 ppm, with a lower detection limit of 500 ppt. A built-in LCD is mounted in the front panel of the unit. The multivalve inlet allows for moisture detection of up to four gas streams. The absorption measurement for moisture is directly calculated through Beer's law on the spectral bandwidth line. Therefore, a moisture standard is not necessary for calibrating the unit but can be used to verify the performance of the unit.


Noncorrosive Gears

Rush Gears

Fort Washington, PA

Thousands of sizes of preengineered gears are suitable for use with sensors, scanners, instruments, automated controls, and robotics. A wide variety of styles and noncorrosive and noncontaminating materials are available, including bevel, spur, rack, change, bronze, Delrin, and stainless. For customers with limited-space requirements, the company also offers chemical-resistant miniature lab gears.


Metrology Station

SigmaTech

Mesa, AZ

An automated measurement station has the ability to handle 200- and 300-mm wafers. The 9600A2-300 uses ABPB measurement technology to provide noncontact gauging. The wafer is measured in a vertical position to prevent any sagging, allowing for the measurement of thickness, bowing, warping (up to 10 mm), and flatness. The station has 3-D wafer-mapping and wafer-sorting capabilities, with a throughput of 15 wafers/hr.


Wafer Marker

Rofin-Baasel

Acton, MA

A wafer-marking unit provides a self-contained minienvironment for topside wafer marking, with options for bottomside wafer marking or backside die marking. The system produces marks that are machine readable and have no negative influence on subsequent manufacturing steps. The unit includes a high-accuracy robot and prealigner. OCR, BC412, and 2-D matrix symbologies are all supported. The Waferlase M300 offers a FOUP and a SMIF for 200- and 300-mm wafers, and an open-cassette platform for 100- to 300-mm wafers. The unit uses a solid-state diode-pumped laser and is SECS and GEM compliant.


Contour/Roughness Analysis

Mitutoyo

Aurora, IL

The CS-5000 is a combination instrument for the analysis of precision forms and surface roughness parameters. An automatic temperature compensation function adjusts measured data to the reference temperature. LaserHologage measuring technology provides a resolution of 2.0 nm. Geometric analysis commands such as point, line, radius, angle, and distance can be used for contour measurement. By teaching the first part in a batch, a program can be developed and recalled to automatically inspect the remaining parts.


Electroplating Monitor

ECI Technology

East Rutherford, NJ

The Qualilab QL-5 analyzer accurately monitors organics, inorganics, and contaminants in the electroplating process. The instrument calculates the concentration of additives and their components in a copper or other electroplating bath, displaying live voltammograms (fingerprints) of contaminant buildup. An automated, user-friendly feature is included in the instrument to facilitate hassle-free navigation through the analysis process. The QL-5, which replaces the QP-4000, is supplied with a PC, monitor, and printer.


High-Precision Tubing Pumps

Micropump

Vancouver, WA

Ismatec-series multichannelled tubing pumps feature up to 40 channels, interchangeable pump heads and tube beds, and flow rates from 0.001 ml/min to 13 L/min. The pumps are chemical resistant and contamination free. Their rugged stainless-steel construction makes them suitable in processing, scientific R&D, and various high-precision applications.


200-, 300-mm Etch Tools

Lam Research

Fremont, CA

The 2300 etch series enables users to scale from 200- to 300-mm manufacturing. The tools support etch applications for sub-130-nm technology nodes and combine extendable technologies for etching new materials and structures. The small-footprint, open-architecture platform handles four process modules for factory and process automation. The Web-capable software facilitates communication from remote locations, supporting shared development and troubleshooting. The Exelan Dielectric 2300 etch system uses dual-frequency confined plasma techology, which is used in volume production in copper damascene, low-k, spacer, contact, via, and in situ hardmask applications. The Versys Silicon 2300 etch system performs in situ waferless auto cleans, enabling high mean times between wet cleans and high yields. It handles aluminum etch and integrated resist removal. The system's modular design allows users to shift from aluminum to copper processes.


Control Ball Valve

George Fischer

Tustin, CA

The Type 110 control ball valve allows a gradual increase in flow rather than the sudden increase typically associated with ball valves. Combining the strengths of linear flow output and the ball design of the Type 346 valve, the Type 110 offers a cost- effective alternative for a variety of situations. The valve's molded, all-plastic construction provides excellent chemical resistance for aggressive-media applications; it requires little maintenance and has a long working life. Available in PVC, PP, and PVDF and in 1/2- to 2-in. sizes, the valve offers high Cv values and small pressure loss in the open position. It features control angles from 9° to 90° for maximum control flexibility. Manual, electric, and pneumatically actuated versions with socket and butt-fusion spigot end connections suit virtually any piping system.


Photomask Pattern Generator

Micronic Laser Systems

Täby, Sweden

The Sigma 7100 is capable of writing photomasks at the 100-nm technology node. The laser pattern generator uses a spatial light modulator (SLM) as a programmable mask. The SLM is an integrated circuit with a flat, mirrorlike surface located within the tool. Deep ultraviolet light is reflected off the surface of the SLM to expose a photoresist on a photomask blank on the tool's stage, forming the pattern of the mask.


Pressure Transducers

Gems Sensors

Plainville, CT

Using thin-film sensing elements to increase stability, Psibar 3000­series pressure transducers drift only 0.06% per six years and are accurate to within ±0.15%. Using high-temperature and kinetically charged gases, the sensing element is fused at the atomic level so that the system's strain gauges are more stable and less sensitive to thermal exposure than their silicon counterparts. The sensors serve pressure applications of 500 –10,000 psi and are immune to RFI of up to 30 V/m. Performance is unaffected in temperatures of ­55° to 120°F. Stainless-steel construction allows use in rugged environments. A variety of output signals, pressure port sizes, and electrical connections are available.


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