INDUSTRY
NEWS
World Beat
IMEC
extends litho program
IMEC
has announced it is extending a program established to push the capabilities
of 193-nm photolithography. The Belgian research center says it will continue
an industrial affiliation program on the technology through 2003. Researchers
at the university-based center in Leuven are exploring ways to push 193-nm
lithography to k1 factors of 0.35 to 0.3 nm. They are using an ASML PAS5500/1100
high-NA step-and- scan system linked to a TEL Clean Track ACT8 resist
coat-development track tool. Installed on IMEC's 200-mm pilot line, the
system is scheduled to begin operation this month.
Calling
the program "a significant stepping-stone to 157-nm lithography," IMEC
says researchers are focusing on one of the most difficult challenges
for optical lithography, the contact hole level. The aim of the program,
which began in 1999, is to push the capabilities of 193-nm lithography
past 100 nm. The program is one of 13 R&D collaborations involving
IMEC and industrial partners.
Supply
of systems assured
ASML
reassured customers that it would meet growing demand for 193-nm imaging
systems in 2002. The manufacturer of lithography and track tools says
its lens supplier, Carl Zeiss, has confirmed the availability of the
ArF Starlith 1100 lens that is integrated into ASML's 200-mm PAS 5500/1100
and Twinscan AT:1100 300-mm imaging systems. Zeiss has the 193-nm lenses
"available in both quality and quantity," according to ASML. Last year
Zeiss opened a plant in Oberkochen, Germany, to manufacture 193-nm lenses,
whose high numerical aperture is essential for ArF imaging of chips
with 100-nm geometries, ASML says.
Asia
Vendor
plans Singapore move
Electroglas
has decided to move its manufacturing operations from San Jose to Singapore.
The company, which manufactures wafer probers and related process management
tools, will begin production at the Asian site by mid-2002. Full production
of probers will begin by mid-2003. Electroglas says the move brings
the company closer to its growing customer base in the region.
Electroglas
will continue to manufacture probers at its San Jose headquarters until
it completes the transition. Company headquarters will remain in San
Jose, and Electroglas will keep its inspection products division at
its current location in Corvallis, OR. All other units will remain in
their locations as well.
Wafer
operations merge
Sumitomo
Metal Industries and Mitsubishi Materials have merged their silicon
wafer businesses. Called Sumco, the new company began operating in February
out of its Tokyo headquarters. The new venture reportedly starts out
life with nearly 25% of the silicon substrate market. The companies,
which had been collaborating on a venture to develop 300-mm wafers,
announced the merger plans in April 2001. Both manufacturers share equally
in the partnership, which comes at a time of relatively slow growth
for suppliers of blank wafers. Sumco has 15 plants located worldwide.
Reijiro Mori, former advisor to the president and director of Sumitomo,
is president of the new company. Minoru Mizukoshi, formerly chairman
of Mitsubishi Materials Silicon, is vice president.
Samsung
readies SOC ICs
Samsung
Electronics says it will use recently developed 130-nm logic process
technology to mass-produce system-on-chip devices and microprocessors.
The South Korean chipmaker uses copper interconnect technology with
the 130-nm process, because copper has lower resistance and heat emission
than aluminum interconnects. Samsung says it will use the new technology
to manufacture high-performance microprocessors and more than 20 next-generation
SOC devices in 2002. The chipmaker expects to sell at least $1 billion
worth of the devices annually by 2005.
Samsung
has developed three process technologies to suit different SOC designs:
a generic process for overall SOC devices; a high-speed process for
cpu and network devices; and a low-power-consumption process for mobile
handsets and PDAs.
Foundry
readies process
Dongbu
Electronics claims its Class 1 fab in Eumsung, South Korea, is on schedule
to qualify a new 130-nm CMOS by the end of June 2002. The new CMOS process,
DL013GD, will be employed to meet demand for next-generation SOC designs
for the wireless, networking, and advanced consumer electronics markets,
according to Dongbu. The technology features FSG and low-k intermetal
dielectric options. In addition, the process has up to eight layers
of metal and polytransistor gate lengths ≥80 nm. The introduction
follows Dongbu's recent launch of a low-voltage 180-nm process.

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