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Enhancements to Axcelis Technologies' FusionGemini ES and Fusion Gemini Plasma Asher dry-strip systems offer chipmakers a flexible dry-strip process with a 40% improvement in throughput in high-volume manufacturing operations. With a wide process window, the tools can handle a variety of dry-strip and polymer-removal applications. The enhanced systems offer improved process performance and increased throughput of up to 180 wafers per hour for FEOL and BEOL cleaning applications. Their downstream microwave design provides efficient photoresist and polymer removal, while avoiding plasma-charge damage. Existing systems can be upgraded. The FusionGemini ES system underwent an earlier H^₂O vapor-assisted enhancement to optimize the dry polymer-removal process. Information: www.axcelis.com.

Actinix has received a patent for high-coherence, high-power vacuum ultraviolet light generation. The patent is applicable to 157-nm semiconductor microlithography and photomask metrology and inspection. The method involves preparing an atomic cocktail of xenon and mercury atoms. The xenon atoms provide the nonlinear effect that creates the vacuum ultraviolet light, while the mercury atoms increase the strength of the interaction through phase matching. High power (up to 1 W) and high-spectral-purity vacuum ultraviolet radiation in the 100–200-nm wavelength range will be possible with the system. Highly coherent vacuum ultraviolet light can be injected into large excimer-laser amplifiers, resulting in improved photolithography exposure tools. Information: www.actinix.com.

By enabling an Anton Paar DHS 900 domed hot-stage heating attachment to be fitted to its X'Pert Pro MRD x-ray diffractometer, Panalytical has extended the instrument's operational capabilities to allow materials researchers to perform thin-film measurements at nonambient temperatures up to 900°C. The diffractometer can be used for thin-film XRD applications such as rocking curve analysis, in-plane diffraction, wafer mapping, reciprocal space mapping, and reflectivity measurements. The attachment can be mounted onto the MRD cradle and is fitted with a dome that is transparent for x-ray diffraction, allowing samples to be investigated in vacuum, air, or inert gas. Information: panalytical.com.

FM Approvals has issued the 20-page Approval Standard 4911 titled "Wafer Carriers for Use in Cleanrooms," which provides users with the performance requirements for such products to earn FM Approvals recognition. The standard has been issued because wafer carriers are fabricated from materials that may pose a fire hazard to chipmakers and require special fire protection. Carriers are evaluated for their ability to limit the spread of fire and smoke damage. Carriers that earn approval status do not require special fixed fire protection. Information: www.fmglobal.com.