
Product Extra!
Newport
has developed deep ultraviolet (DUV) coating process improvements that
enable excellent lifetime results. The company achieved a new
pulse lifetime record for its DUV coatings on an optic produced on a
fused silica substrate that is a high reflector for 193 nm, delivering
reflectivity of 98.2% at near-normal incidence. This mirror
survived exposure to more than 11 billion pulses (5 mJ/cm2
at repetition rates of up to 4 kHz) from an argon fluoride laser without
catastrophic failure. Furthermore, within measurement tolerance, it
did not experience a decrease in reflectance. Information: www.newport.com.
Trebor
has received a patent for its high-purity quartz electric resistive
heater technology, which is used in the company's Quantum DI-water
heater product line. The patent relates to the thin-film-on-quartz electrical
resistance heater element, which provides high temperature response
and greater reliability than heating methods that require frequent bulb
changeouts, such as in infrared heating. The proprietary design has
no metal exposure and virtually eliminates the risk of contamination
in the event of element failure. The company plans to incorporate the
technology into a range of products. Information: www.treborintl.com.
(Semicon Europa, Booth B2.476)
A
redesigned Web site from Saint-Gobain Performance Plastics Microelectronics
Business features easy-to-use navigation and search features, in addition
to news and events. The site provides information on Furon
and AstiPure fluid-handling products for critical applications. Product
literature on high-purity valves, fittings, pumps, tubing, regulators,
and accessories can be viewed. The business unit offers other semiconductor-grade
fluid-handling products, such as integrated manifolds. Information:www.microelectronics.saint-gobain.com.
(Semicon Europa, Booths B1.455, B1.352)
Akrion
has received a U.S. patent for a system that uses the company's DIO3
ozonated-water photoresist stripping process. The patent covers
the system and hardware, which reduce the boundary layer thickness in
the DIO3 fluid-flow field, increasing the photoresist's
strip rate. The process allows manufacturers to use a benign
formula of DI water injected with ozone for many resist-strip steps.
It reduces the use of sulfuric acid, hydrogen peroxide, and DI water,
reducing the cost of ownership and eliminating costs associated with
generating and disposing of chemicals. Information: www.akrion.com.
(Semicon Europa, Booth B2.408)
Version
2.1 of eCentre from ILS Technology, which establishes secure connections
between IC equipment in the fab and OEMs as well as among fab engineers
both inside and outside the facility, offers nine new features.
One feature is a light-pole status function, which enables authorized
users to log into the system and see a tool's status indicator lights,
as if they were actually on the fab floor. Another feature is a data
viewer that allows users to view data that are being collected from
a tool through the SECS/HSMS port or a formatted XML data stream based
on the SEMI PR8 equipment data acquisition standard. Two file management
features have also been added: an automatic file-download function that
downloads specified files at specified times to an authorized destination,
and a feature that enables users to review a list of files that have
been replaced or deleted from the tool. Information: www.ilstechnology.com.