MICRO: Products

Large-Area Stepper

Azores

Wilmington, MA

The Model 5200 PanelPrinter system performs advanced photolithography for large-area substrate applications that require 0.8–4-µm resolution. Fully integrated subsystems include a high-fidelity projection lens and illumination system, a precision x-y stage, an automated substrate-alignment system, and an automated reticle-handling and -storage system. The system features a variety of lenses to meet the needs of active-matrix LCD, FED, OLED, polysilicon, and high-density interconnect applications. It also offers real-time magnification adjustment via a six-degrees-of-freedom reticle chuck for accurate layer-to-layer registration and autofocus measurement and compensation. Metrology sensors used to calibrate and optimize the system perform transmission alignment, modulation transfer, illumination intensity, and reflective alignment functions.

FOUP Cleaner

Entegris

Chaska, MN

A system for cleaning front-opening unified pods (FOUPs) reduces contamination from human contact. The Process One FX30 cleaning system resides in an individual cleanroom environment to prevent contamination and has robotic controls that transport FOUPs through the cleaning process. It helps semiconductor manufacturers to reduce overall operating costs by offering high throughput, reliability, and low utility consumption. The unit is designed to clean and dry the company's FOUPs and front-opening shipping boxes (FOSBs). It isolates the cleaning media used inside the FOUPs and FOSBs from the cleaning media used outside, preventing cross-contamination. (Semicon Europa, Booth B1.118)

Micromachining System

New Wave Research

Fremont, CA

MicroMill, a high-precision micromachining system, combines submicron stage resolution and positional accuracy with high-magnification viewing of the work piece. The instrument micromachines MEMS, semiconductors, and other materials. It enables operators to draw precise patterns, cuts, characters, and holes on-screen and view the work- piece throughout the process. The tool's stage resolution on three axes allows users to micromachine over 2 in. in all directions. The system features an automated height gauge that determines the thickness, contour, and slope of the workpiece. Its high-resolution stereomicroscope and color CCD video camera ensure close-up viewing and on-line image digitization. The instrument comes complete with a computer, flat-screen monitor, and Windows XP–based software with GUI controls.

Substrate Etch Tool

SEZ

Villach, Austria

A substrate etch tool performs wafer-thinning, surface-conditioning, and stress-relief processes for front-end wafer manufacturing and back-end assembly/packaging applications. The Galileo GL-210 spin processor is used to optimize the surface of the bare wafer before device patterning. The tool is for use with traditional silicon, silicon-on-insulator, gallium arsenide, and other compound semiconductor materials. Such materials require surface conditioning and stress relief because they tend to be thinner and more susceptible to mishandling, warping, bowing, and breakage than epitaxial silicon wafers. The tool removes imperfections caused by mechanical grinding while improving die/wafer strength, electrical characteristics, metal adhesion, and uniformity. It etches the wafer in one multilevel process chamber using a customizable combination of nitrogen, DI water, and chemicals that can be either drained or recycled. (Semicon Europa, Booth B1.122)

Nonstandard Thermocouple

Watlow

St. Louis

Watcouple, a nonstandard thermocouple, provides more-accurate measurements and exhibits three times less drift than type-K thermocouples, resulting in a longer-lasting sensor. Compared with traditional thermocouples, which are designed primarily for linearity and made of complicated alloys that compromise accuracy, stability, and longevity, the Watcouple uses alloy 600 and nickel-silicon. Based on IEEE 1451.4 smart-sensor technology, it automatically communicates its individual voltage table, calibration, manufacturing, and traceability information. (Semicon Europa, Booth B2.554)

Dry Strip Platform

Axcelis

Beverly, MA

The RapidStrip 320 resist and polymer removal systems use downstream microwave plasma generation and chuck-based wafer heating to provide an effective dry strip process. Small process vacuum chambers enable high ash rates and excellent process repeatability. The small-footprint tools are available in single- and dual-chamber configurations. Available in 200- and 300-mm versions, the systems are based on a simple design that reduces cost of ownership and improves productivity in front-end-of-line process applications. (Semicon Europa, Booth B2.200)

E-Beam Litho Modeling Software

Sigma-C

Munich, Germany

E-beam lithography simulation software is used to optimize maskmaking and direct-write applications. Selid version 3.3 software models the entire E-beam lithography process in three dimensions. Using the software, photomask producers and IC manufacturers can develop and optimize processes for reticle writing, direct-write on wafers, and other E-beam lithography applications. It can reduce cycle times and development costs because users can run hundreds of virtual wafers or masks overnight without using production resources. The software provides fast, comprehensive modeling techniques, such as the Monte Carlo method for simulating E-beam scattering, and can model the use of advanced chemically amplified resists. Additionally, it enables users to view their results and determine the effectiveness of different process steps by providing energy density as well as latent and resist images.

HEPA and ULPA Filters

Airguard

Louisville, KY

Microguard 99 filters for use in semiconductor and other environments are available in 99.97%, 99.99%, and 99.999% efficiency models at the 0.3-µm particle-size level. Standard- and high-capacity filters are available. A wide variety of cell side materials is offered, including wood, steel, and aluminum. The filter media are made of wet-laid paper produced from micro- glass fibers. The paper is waterproof and heat-resistant to 1000°F. A channel design optimizes the media surface area and reduces the possibility of damage during handling. Corrugated aluminum separators enable the maximum use of the media and high filter-pack integrity.

RF Delivery System

Advanced Energy Industries

Fort Collins, CO

The 3-kW Apex RF delivery system for thin-film processes provides high power density and power delivery consistency. The compact, half-rack unit employs RF-conversion technology, eliminating the need for front-end dc-to-dc conversion components and thus increasing cost effectiveness. An optional internal match network reduces extraneous equipment. The modular unit's delivery system can be customized to suit specific processes. Users are offered a range of preferences such as input voltage and on-board RF-connector location. (Semicon Europa, Booth B1.608)

Gasket Filter

Mott

Farmington, CT

A filtration product that can be installed with virtually no design change to existing gas-delivery systems protects particle-sensitive gas control components such as regulators and mass-flow controllers without adding length to the gas panel or gas stick. The GasShield gasket filter is compatible with inert and specialty gases, providing precise filtration in gas flows as low as 1 std L/min. Available in patented NanoMetal nickel media, the filter fits inside 1/4-in. face seal fittings. It provides true 0.003-µm filtration (>99.9999999% particle removal efficiency measured at the most penetrating particle size). It is recommended for applications with temperatures up to 450°C (for inert gases) and a maximum differential pressure of 1000 psid (at 20°C).

High-Purity Pressure Sensor

Setra Systems

Boxborough, MA

The Model 227 pressure transducer is for use in modular gas-delivery systems or panels to monitor specialty gas processes in high-purity applications. Based on variable-capacitance sensing technology, the compact, lightweight unit offers excellent zero stability and long-term reliability. It has a 1.125-in. down-mount C Seal pressure fitting and small swept sensor chamber made from VAR 316L stainless steel that is electropolished to a 5-Ra finish for contaminant-free operation and system-purging capability. Every sensor undergoes mass spectrometry helium leak testing to 1 X 10^–9 atm.cc/sec. The sensor is available with 5-V dc, 10-V dc, or 4 to 20-mA output with 0.25% of full-scale or 1.0% of reading accuracy. It offers pressure ranges from 0–25 psi to 0–3000 psi in gauge, absolute, or compound pressure. (Semicon Europa, Booth B1.749)

Particle-Detection System

Dr. Schenk

Planegg/Martinsried, Germany

The Pollux automated particle-detection system enables fabs to perform complete inspection of all masks and reticles before they are used. More cost-effective and reliable than performing visual inspection, the system can be integrated into bare-reticle stockers, wafer steppers, and cleaning stations. It can also function as a stand-alone unit. The system inspects the glass side and pellicle side of the mask simultaneously and can detect imperfections down to a 10-µm equivalent sphere diameter. It detects particulate contamination and defects such as glass scratches and holes in the pellicle. The small-footprint, high-speed system enables fabs to make pass/fail decisions about photomasks. (Semicon Europa, Booth B2.484)

Postash-Residue Remover

Mallinckrodt Baker

Phillipsburg, NJ

Baker Rezi-68 postash-residue remover eliminates metal-organic residues and sidewall polymers from metal and via structures. It operates at temperatures ranging from 20° to 45°C and can extend processing times to more than 24 hours. It is compatible with low-k dielectrics and can be used to remove both aluminum- and copper-based residues. The postash-residue remover is >80% water, making it safer to use and less expensive to dispose of than hydroxylamine-based chemistries. (Semicon Europa, Booth B1.639)

Ultrastiff Platforms

Technical Manufacturing

Peabody, MA

An ultrastiff platform for photolithography scanners and other fab equipment, TechCast combines a proprietary laminated-steel plate with a high-strength resin-aggregate core. The cleanroom-compatible platform can be drilled and tapped. Custom cutouts and notches are available. Engineered in cooperation with semiconductor toolmakers, the platform is designed to exceed the stiffness of the fab floors to which it is mounted and can be moved as fab requirements change. It can be combined with the company's support stands to accommodate any floor height. The stands are compatible with a variety of subfloor geometries and popout patterns.

Wet Process Tool

AP&S

Donaueschingen, Germany

The TwinStep wet process tool combines two process stations: a flow-optimized immersion bath for circulation processing and an overflow processing system. In contrast to manual benches, the system offers controlled processing, from automated chemical mixing to processing to service functions. A flexible tool architecture offers a broad range of configurations that are suitable for photoresist strip, metal and oxide etch, and cleaning processes. Optimized process baths for wafers of different sizes help keep chemical consumption low. The unit's AeroSonic drying technology can be enlarged to perform chemical treatment, rinsing, and drying in one bath. The unit is for use in MEMS, gallium arsenide, and other applications. (Semicon Europa, Booth B2.528)

Flex Cable Heaters

Durex

Cary, IL

Flexible, high-watt electric cable heaters are used in semiconductor manufacturing and other processes. The heaters have a sealed leadwire transition that eliminates contamination, while achieving operating temperatures to 1500°F. An optional internal thermocouple can be placed at various points for precise temperature control. The cable heaters are offered with customized wattage and voltage. Sheath materials include 304 stainless steel, 316 stainless steel, Inconel, and Incoloy. Standard sheath cross sections range from 0.062 to 0.375 in. in diameter. Leadwires can be made of PTFE or encased in fiberglass sleeve, stainless-steel flex cable, or stainless-steel overbraid.

Turbomolecular Pumps

BOC Edwards

Wilmington, MA

STP-XH magnetic-bearing turbo pumps feature state-of-the-art turbine designs that maximize helium and hydrogen pumping speed, thereby increasing throughput without sacrificing the pump's ability to handle heavier gases such as argon or nitrogen. The pump can be used in shallow-trench-isolation applications using high-density plasma/chemical vapor deposition. In etch applications, the pump enhances process quality by reducing partial pressures of hydrogen, a by-product of plasma decomposition.

Data-Access Software

Cimetrix

Salt Lake City, UT

CIMPortal, an EDA+ software tool, enables fab-level access to critical equipment data such as SECS/GEM data, high-speed OEM and fab add-on sensor data, historical data, full tool-level software-version control data, and configuration data gathered from OEM suppliers. Without programming, the software can access all GEM data from a 200- or 300-mm tool via an EDA+ secure port.With programming, it can be configured to collect sensor data directly from OEM tools and allows add-on sensor bus information to be shared over one synchronized data-collection plan (DCP) or multiple DCPs. The software has a powerful data historian, which enables high-speed logging and data-mining via EDA. (Semicon Europa, Booth B2.634)

Air-Filtration System

Donaldson

Minneapolis, MN

A gas-phase molecular contamination filtration system supplies high-purity air to IC process tools. The small-footprint Lithoguard-16 has chemical filter inserts that can be configured to minimize contaminant breakthrough and maximize overall media utilization. The system controls airborne contamination, which increasingly degrades expensive optical elements and adversely affects critical chemical processes. The chemical media target acidic and basic gases, and volatile organic compounds. The media's removal capacity can be adjusted for each target depending on actual process conditions. The company offers chemical-filter refurbishment and used-filter analysis programs. (Semicon Europa, Booth B2.211)