TEAM taps FEI
U.S. Department of Energy–funded nanotechnology research program
focused on the subangstrom world has selected FEI to be its R&D partner.
The project, known as TEAM (for Transmission Electron Aberration-corrected
Microscope), will build the highest-resolution scanning/transmission electron
instrument in the world. Participants say the proposed 300-kV tool will
be capable of direct observation and analysis of individual nanostructures
at an atomic-level resolution of 0.5 Å.
five major research labs involved in TEAM—Argonne, Brookhaven, Lawrence
Berkeley, Oak Ridge, and Frederick Sietz—chose FEI largely because of
the advanced corrector technology for electron microscopy that the company
has developed in cooperation with its German partner, CEOS. "FEI's new
dedicated corrector platform is the most viable starting point for the
TEAM microscope because it is compatible with the extraordinary stability
needed in aberration-corrected instruments," says Uli Dahmen, TEAM's scientific
director and head of the National Center for Electron Microscopy (NCEM)
in Berkeley, CA, where the first TEAM microscope will be assembled.
of the greatest benefits to researchers and industrial users is that the
new [dedicated corrector] platform will provide important flexibility
for future development of component upgrades," adds George Scholes, FEI's
vice president for its scanning/transmission microscope product line.
entrepreneurs, inventors, and companies with fresh ideas in the semiconductor
and related manufacturing spaces: SEMI seeks your presence at the third
annual Technology Innovation Showcase (TIS), to be held at Semicon West
2005. The trade association is looking for innovative software, equipment,
processes, materials, and services that meet the following criteria: must
be a new or original invention, provide practical solutions to real problems
in the chipmaking or related industries, have data validating the invention,
and should not be a fully released product within the semiconductor industry.
innovators need to complete an application, which includes a 250-word
description of the innovation and brief speaker biography, by February
6. A panel of business professionals and industry technologists will review
the proposals and select innovations based on technical merit, significance,
solutions/results, and industry contributions. The selection committee
will notify all applicants of their decision by March 12. Selected companies
will get a booth in the special TIS pavilion for all three days of the
July show, an opportunity to make a presentation at the adjacent theater,
and admission to the SEMI President's Reception. For TIS applications,
a list of rules and requirements, and general information, go to www.semi.org/tis.
Border gets grant
Mexican federal and Baja California state governments have finalized agreements
with the Silicon Border Development group for a grant and expanded exclusivity
deal for a semiconductor-focused science park along the U.S.-Mexico border.
The amount of the grant, some of which comes from Mexico's Prosoft program,
was not disclosed. The exclusivity agreement has been lengthened to 24
months by the state, allowing planners to develop commercial land use
and utilities considerations for the 10,000-acre technology zone in Mexicali.
traditional thought process has been immediately to outsource to Asia
because the costs and efficiency models couldn't be beat," notes Len Jelinek,
principal analyst for iSuppli. "However, Silicon Border, with the full
support of the Mexican government, has devised a win-win model that offers
an interesting economic alternative and absolutely suggests the possibility
of bringing some cost-effective manufacturing back to North America."
ships tool to ATDF
first flash-assisted rapid thermal processing system targeted for ultrashallow
junction (USJ) applications at 45 nm and below has been delivered by Mattson
Technology to ATDF. The Austin, TX–based R&D and custom manufacturing
center (the former Advanced Technology Development Facility, spun off
from Sematech) will act as beta-site partner for the equipment company,
integrating the new millisecond flash annealing technology into its processes.
The first phase of the program will be proprietary to Mattson's field
of use, while the second phase will allow customers and ATDF to beta test
the tool and technology.
integrated beta-site testing will save Mattson significant R&D investment
and enable the company to fully use our 300-mm capability," explained
Juergen Woehl, the center's general manager. "ATDF's superior cycle time
will enable Mattson to learn the integration of its proprietary technology
in record times. This collaboration will facilitate ATDF's transition
to full 300-mm processing capabilities and will create opportunities for
external researchers to work with our supplier partner."
metrology equipment supplier Bede has appointed one of the industry's
leading executives as nonexecutive chairman of the board. Stuart McIntosh,
executive vp of operations and president of lithography at ASML and former
COO of Philips Semiconductor, joins the UK-based company. Former chairman
Norman Price will stay on as a nonexecutive director.
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