Product Technology News

Defect-Review Tool

FEI

Hillsboro, OR

A high-resolution 200-mm-wafer inspection tool, the XL810 features a Hexalens E-beam column that handles accelerating voltages of 200 V to 30 kV. The SEM-based system obtains resolutions better than 3 nm independent of beam voltage in the 1- to 30-kV range and switches directly between field-free and immersion modes. Pure secondary electron images for composition contrast result in enhanced grain-boundary imaging of metal lines and polysilicon, as well as enhanced contrast for contact-hole imaging. Samples can be rotated without affecting the resolution while keeping the defect in view at magnifications >20,000×. A Windows-based interface makes the XL810 easy to use. (Semicon/West, San Francisco, South Hall, Booth 2715)

X-Y Stage

Dover Instruments

Westboro, MA

An x-y stage is made specifically for use with 300-mm wafers. Preloaded air bearings and precision granite reference surfaces provide straightness and flatness of travel below ±0.25 µm. Brushless linear servomotor drives allow velocities up to 800 mm/sec. Dual motors/encoders in the y-axis allow balanced drive and active yaw control. Positioning repeatabilities from ±0.025 to ±0.25 µm are achievable. The cleanroom-compatible system can be used in lithography and inspection. (Semicon/West, San Francisco, Gateway Hall, Booth 3103)

Quartzware Cleaner

Poly-Flow Engineering

Sylmar, CA

The OmniClean 200-mm quartzware cleaner uses half the typical amount of DI water and cuts 25% off the cleaning time of related systems, according to the company. The unit's left chamber has a rotating carousel for pedestals, cantilevers, boats, and other quartz parts. The right chamber provides bidirectional cleaning for quartz tubes or liners. Chemicals are automatically blended and sprayed on the inside and outside of tubes, and single-use acid is sprayed from dedicated piping for a final etch. Four heights are available. (Semicon/West, San Francisco, South Hall, Booth 2201)

Automatic Agitation System

Victor Associates

Ivyland, PA

The Model 966 automatic agitation system accommodates up to 6-in. wafers and provides wet chemical process uniformity. The system is controlled by a remote control box. Made of polypropylene and PVC, the compact unit measures 8 × 5 1/8 × 12 5/8 in. and can be installed above the work surface. (Semicon/West, San Francisco, South Hall, Booth 1500)

Carrier Lifetime Measurement

Amecon

Berlin, Germany

The Janus system uses the µ-PCD technique of laser-induced, photoconductive decay as a noncontact measurement method for controlling metal contamination. Features include low injection mode allowing for fast and reliable lifetime mapping, different excitation sources for surface and bulk analysis, an adjustable microwave reflector for optimal signaling, and user friendly software with automatic parameter setting, statistics, recipe function, and data processing. The system accommodates 300-mm wafers. (Semicon/West, San Francisco, South Hall, Booth 1435)

CMP Blending System

MEGA Systems & Chemicals

Chandler, AZ

The MEGAblend 1100PV precision blending system is designed for post-CMP clean dilute NH₄OH and HF. The system blends the two chemicals with DI water, combining the performance of pumps with the purity of pressure vessels. It complements the company's slurry-distribution technology. (Semicon/West, San Francisco, Esplanade Hall, Booth 4320)

Fluoropolymer Process Assemblies

Scientific Machine and Supply

Middlesex, NJ

High-performance sanitary processing assemblies are custom made using a Scilon fluoropolymer process. Offering an alternative to stainless steel, semiconductor-grade Scilon is made of a modified resin that enhances thermomechanical performance. Single-piece construction enables the assemblies to withstand high temperatures and pressures.

Water Pumps

CTI-Cryogenics

Mansfield, MA

On-board water pumps are designed to decrease particle formation during metal-etch processing. When mounted in etch loadlock and transfer chambers, the pumps trap water vapor at the source and diminish particle formation. The reduction in particulates can improve tool productivity by reducing the frequency of process chamber cleaning. The increase in water vapor pumping speed also lessens the wet-clean recovery time. (Semicon/West, San Francisco, North Hall, Booth 5968)

Process Control Software

Cognex

Natick, MA

The acuCoder PC plug-in coding system operates on any Windows 95 or NT computer and generates 2-D codes that let users store manufacturing histories and test data. The companion acuReader/2D uses advanced image analysis and image-processing techniques to provide fast, reliable code reading even with low contrast and poorly formed marks. The Windows-based software is useful for semiconductor process control, parts tracking, and inventory control operations. (Semicon/West, San Francisco, North Hall, Booth 5027)

Laser Stepper

Canon USA

Lake Success, NY

The FPA-3000EX4 KrF excimer laser stepper is equipped for mass production of 64- and 256-Mb semiconductors. Features include a linear motor air-guided tilting stage for high throughput and alignment accuracy, off-axis illumination mode for strong depth of focus, and a tilt focusing system for improved edge-shot chip yields and focus reliability. A broadband TV image-processing alignment technique en-sures accuracy on CMP layers without additional process steps or experimental hardware modifications. Throughput is 73 wafers/hr or higher. (Semicon/West, San Francisco, North Hall, Booth 5514)

Tube Meter

Brooks Instrument

Hatfield, PA

The MT 3809 is a metal-tube VA meter offering 2% full-scale accuracy, high repeatability, and the ability to handle high temperatures and pressures. The throughflow meter operates with minimal pressure drop and requires no back pressure. It provides increased damping for gas applications to eliminate unwanted float bounce. One standardized lay length accommodates connection sizes from 1/2 to 4 in. A sight-flow accessory is an option. (Semicon/West, San Francisco, South Hall, Booth 616)

Pattern-Recognition Software

Knights Technology

Sunnyvale, CA

SPaR spatial-pattern-recognition software lets users relate defect shapes or signature patterns to process-related causes in real time. The software also allows engineers to import the wafer-map data generated by inspection tools and automatically sort defect shapes into signature patterns. The patterns can then be used to streamline automatic defect classification by grouping multiple defects from a single source. Complex algorithms also can capture global events. (Semicon/West, San Francisco, North Hall, Booth 6657)

Wafer Inspection

Vision Engineering

New Milford, CT

Dynascope inspection tools with wafer-handling attachments offer throughput speeds as fast as 900 wafers/hr with minimal manual handling that can damage wafer surfaces during inspection. Handler features include single-button operation and preprogrammable movement sequences for repetitive inspection and meaurement techniques. Each handler can accept wafers up to 8 in., and autosizing to accommodate 4- , 5-, or 6-in. wafers is available. The Dynascope tools can be equipped with an electronic filar and microprocessor or displacement measurement stages. (Semicon/West, San Jose, McEnery Hall, Booth 12036)

Fault-Detection Software

Triant Technologies

Vancouver, British Columbia, Canada

Newly enhanced features of ModelWare/RT 2.8 fault-detection software include an alarm system that detects subtle faults on individual signals and greater off-line data analysis capabilities that can pinpoint alarms occurring during wafer processing. Additional features are quick access to archived data files, improved equipment health summary reports, and improved installation, setup, and configuration components. The model-based alarm automatically identifies processing and equipment faults before the next wafer is loaded, decreasing yield loss. The software also can be configured to automatically stop equipment when a fault is detected. (Semicon/ West, San Francisco, South Hall, Booth 3018)

Contamination Analysis System

Hitachi Scientific Instruments

Tokyo, Japan

An organic contamination analysis system can measure organic particles >=0.8 µm and organic film residues at thicknesses >=20 nm. The system's PC-controlled fluorescence microscope spectrophotometer is equipped with a motorized stage capable of handling 6- or 8-in. wafers. The nondestructive system is an alternative to traditional analysis methods such as SEM/EDX for characterizing organic impurities and residues. (Semicon/West, San Francisco, North Hall, Booth 5180)

Film Metrology Tool

Rudolph Technologies

Flanders, NJ

The Vanguard SpectraLaser 200 XL uses lasers at 458, 633, 780, and 905 nm and features a deep-UV reflectometer for film measurements in CMP, CVD, diffusion, etch, and lithographic applications. The instrument's throughput is 100 wafers/hr. The tool features a SMIF open cassette or Pod I/O interface, and its fully integrated microenvironment has an airflow design that directs particles away from the wafer. (Semicon/West, San Francisco, North Hall, Booth 5761)

Cleanroom Vacuum

Nilfisk

Malvern, PA

The 545 floor machine combines a high-filtration floor buffer with a vacuum cleaner for performance that meets cleanroom standards up to Class 10. It features a four-stage filtration system, beginning with a two-ply disposable bag in a dust container followed by a polyester main filter, felt microfilter, and HEPA or ULPA exhaust filter. The final filters retain 99.97% of particles >=0.3 µm and 99.999% of particles >=0.12 µm, respectively. (Semicon/West, San Francisco, North Hall, Booth 6454)

Metrology System

Leica

Wetzlar, Germany/Deerfield, IL

The LMS IPRO x/y metrology system for photomasks and wafers has a short-term repeatability of <5 nm, a long-term repeatability of <7 nm, and accuracy of <12 nm, all of which values are a maximum of three standard deviations across a 125-mm² array on a 6-in. photomask. The instrument's laser system has a resolution of 0.6 nm for stage positioning accuracy, and a CCD camera for image processing and edge detection. (Semicon/West, San Francisco, North Hall, Booth 5226)

Data-Analysis Software

Electroglas

Santa Clara, CA

SORTnet 3.0 test-area software provides file and wafer map management across a factory network. The software's high-speed Ethernet network connection permits uploading and downloading of files in a few seconds, allowing wafer probers to receive instructions and operate almost immediately. The SORTview software allows the transfer of product files among probers across the network, enabling an operator to work with all probers on a sort floor through one master file. A SORTconnect prober interface offers an advanced recovery spooling feature that automatically saves wafer maps locally if the network fails. (Semicon/West, San Francisco, North Hall, Booth 5953)

Temperature Controller

Watlow Electric Manufacturing

St. Louis, MO

The Series 935B temperature controller and timer features an input for remote timer start to provide flexibility for handling applications that require temperature control with a countdown timer. The timer operates in a selection of on/off delay/signal modes. The compact panel-mounted unit also features three large soft-touch buttons for ease of operation. (Semicon/West, San Francisco, South Hall, Booth 2742)

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