Wafer Inspection System

KLA-Tencor

San Jose, CA

Designed for inspecting wafers in CMP and other advanced interconnect processes, the ILM-2230 combines small-pixel, high-data-rate image processing with oblique-angle darkfield laser illumination for high-throughput production line monitoring. By reflecting light off the wafer at an angle instead of directly, darkfield illumination increases surface selectivity and suppresses noise caused by any granular features on the wafer surface. The tool's low-noise, high-speed sensor is specifically designed for darkfield illumination. The system can detect microscratches, residual metals and tungsten, pattern deformations, microbridging, and other yield-critical defects on devices with linewidths ¾0.25 µm. Two advanced optical filtering techniques facilitate collection of nonrepetitive defect signals and block noise from vertical and horizontal lines. In addition, the company's proprietary segmented autothreshold image processing technique integrated in the system enhances defect detection sensitivity on wafers with the metal and color variations found in CMP and metal etch processes.

i-Line Step-and-Scan Tool

ASML

Tempe, AZ

The PAS 5500/400 can process 96 200-mm wafers per hour and is capable of producing device resolutions down to 0.28 µm. The system incorporates a Carl Zeiss Starlith 400 i-line lens with a numerical aperture of 0.65. A 3.5-kW mercury arc lamp and a Carl Zeiss Aerial illuminator ensure high-volume throughput. The unit is designed to work together with the company's PAS 5500/500 DUV step-and-scan system, which can resolve critical device layers down to 0.18 µm. The DUV and i-line systems provide a mix-and-match solution for 0.22- to 0.18-µm lithography processes. Unlike step-and-repeat technology, the step-and-scan approach minimizes lens distortion, with matching between the PAS 5500/400 and 5000/500 systems specified at 70 nm.

300-mm Wafer Dryer

YieldUP International

Mountain View, CA

The Omega2000 cleaner/rinser/dryer produces particle-neutral hydrophobic or hydrophilic wafers @ 0.16 µm using motionless surface tension gradient technology. The system's CleanPoint filter removes particles >=0.065 µm from DI water. Mean time between failures is 3000 wafers. The system operates at room temperature, and the DI water is clean at discharge; no reprocessors are required.

Ring Organizer

Frederickseal

Manchester, NH

The O-Ring Security System incorporates three kits for organizing 1613 O-rings into 77 verifiable sizes. The system simplifies selection and helps users ensure they have an adequate supply of the components. O-rings are organized by cross section with a range of 1/8 to 1 3/4 in. diam in <1 cu ft. Packaged in a corrugated plastic file box, the system accommodates elastomer, Teflon, and quad rings as well as hydraulic seals and other lightweight items. The system contains 100 labeled plastic bags for restocking needed sizes. An O-ring tester, extractor tools, cord kit, and cutting jig are included.

Electrostatic Plasma Probe

Hiden Analytical

Warrington, England

Suitable for RF and dc plasma reactors, the ESP Langmuir electrostatic probe provides automatic measurement, real-time display, and storage of key plasma parameters. The system enables accurate identification of process changes, including plasma potential, ion densities, electron densities, and electron temperature. The small probe tip design and efficient RF compensation ensures that spatially resolved measurements can be obtained with minimal plasma disturbance. The probe monitors plasma stability and reproducibility from process to process and from run to run, and it rapidly detects changes in power/impedance, pressure, or gas concentrations. Windows-based software offers postprocessing functions for data analysis.

Parametric Tester

Keithley Instruments

Cleveland, OH

The Model S900NT tester links high-speed instruments, a low-noise switching matrix, a PC, and proprietary testing software to create a system for monitoring MOS and bipolar processes and device development. The tool operates under Windows NT, and features source-measure units that can be programmed to apply voltages ¾100 V and currents ¾1.5 A. The Model 9631 integrating voltmeter digitizes the source-measure unit output for processing by the testing software. Optional capacitance and current measurement instruments enhance accuracy. The modular system adapts to emerging test requirements, accommodating a network interface or additional instruments such as a pulse generator. The software's GUI guides users through the development of a test plan. A parametric testing software library contains more than 50 subroutines for characterizing a wide range of devices.

Circular Connectors

W.W. Fischer

Atlanta, GA

Electronic connectors for cleanroom use are made with semicircular keying systems to prevent damage to contacts and insulation materials. Available in custom or standard designs, the devices come with high-voltage, thermocouple, coaxial, triaxial, multipole, and mixed-contact configurations. The parts are manufactured in compliance with ISO 9001 and feature precision-machined shells in plastic, brass, aluminum, or stainless steel. The connectors can be filled with integral shielding for applications sensitive to EMI and RFI. Conformance with EMC 92 standards is designed to help OEMs meet global electromagnetic compatibility requirements. More than 30 sealed and unsealed body types are available for cable and panel mounting.

Motorized Microscope Stage

Prior Scientific

Rockland, MA

The H116 stage accommodates 200-mm wafers, flat-panel displays, and photomasks. The stage travels a full 10 x 8 1/2 in. and contains all fittings for specific microscope or optical systems. Step-size resolution ranges from 0.1 to 10 µm. Optional linear scales ensure precise positioning with repeatabilities to 0.5 µm and accuracies to 3 µm. The stage comes with a 2- or 50-mm-pitch ball screw. Crossed roller ways, zero backlash recirculating ball screws, and two high-precision motors are also standard features.

Modular Microscope

Leica

Deerfield, IL

The Class 1—compatible INM 100 modular microscope for wafers and photomasks features an 8-in. stage, tilting viewing head, and fingertip operation capability. The microscope's optical system produces high-resolution and high-contrast images in all illumination modes. Darkfield imaging and TV imaging for digital recording are standard. Additional features include a motor-driven, high-precision, focus with selectable settings and integrated safety stop. A retrofittable confocal module is available, and a transmitted light option makes the tool suitable for simple mask inspection.

Weld Heads

Arc Machines

Pacoima, CA

Measuring 17/10 in. each, two weld heads are designed for use in small spaces where clearance is limited. The Model 8-2000 accommodates welds measuring 1/2 through 2 in. diam, while the Model 8-4000 can be used for welds measuring 1 through 4 in. diam. The narrow heads can be used to weld fitting-to-fitting assemblies using fittings of standard lengths. Both heads are water cooled, making them suitable for high-duty cycling or heavy-wall use.

Multichannel Alarm

Peek Measurement

Houston, TX

Designed for critical monitoring applications, the Model 4400 alarm handles a wide range of inputs, including resistance thermometers, thermocouples, and vibration sensor signals. Relay outputs can be arranged by function to provide selective closure to PCs, PLCs, and similar external devices. This feature permits users to control how the relays will operate on alarm. Optional software for use with MODBUS communication gives users remote access to information such as trends and event logs. The software program remotely acknowledges and resets the alarm, and color keys show the alarm's status. The trend analysis feature allows users to designate six different traces, and the event log function records alarm and fault status, as well as any action taken. The log can be saved for later examination. The alarm is available in 6-, 12-, and 24-channel versions.

300-mm Wafer Cleaners

Polypros

Roseville, CA

The Microclean 960 series systems are suitable for cleaning 300-mm wafers and other large substrates, including flat-panel displays up to 1000 x 1000 mm. The tools come in a megasonic configuration using a high operating frequency that causes liquid to oscillate close to the substrate surface. This level of agitation removes particles down to 0.05 µm. An ultrasonic configuration is also available. All the units employ high-temperature piezobonding technology to handle temperatures ¾120°C. The systems' process baths can be made of PFA, ECTFE, PVDF, quartz, or 316 stainless steel.

Cleanroom Lighting

Lightolier

Fall River, MA

Designed for cleanroom use, Cleanguard luminaires incorporate nonhygroscopic wiring to eliminate atmospheric moisture. The luminaires are sealed between the plenum and the fixture to prevent transfer of contaminants, and they contain no gaskets or similar materials that peel or flake. The cleanable lighting comes in lay-in-grid and flanged styles with housing assemblies of either 20-gauge cold-rolled steel or 20-gauge 304 stainless steel. Surface box, corner mount, surface wraparound, and teardrop luminaires are also available. The one-piece door frames feature welded corners and beveled edges. Sizes range from 2 x 24 to 2 x 96 in. for teardrop models and from 1 x 4 to 2 x 4 ft for flanged, lay-in-grid, surface box, and corner mount styles.

Digital Sensors

SUNX

West Des Moines, IA

For high resolution and accuracy, DP2 series digital pressure and vacuum sensors feature a bright-red three-digit LED that is visible from a distance. The sensors can be set in four standard modes using front-panel push buttons. The modes are hysteresis, window compare, autoteach, and dual output. The sensors can also be programmed to display measurements in six different units, including pound per square inch and bar. The units operate on 12/24 V dc. Two independent outputs and a 1-to-5-V analog output are standard features.

Digital Microscope

Seiwa Optical

Pearl River, NY

A digital microscope is compatible with IBM and Macintosh computers and can download and transfer images through the Internet. No eyepiece is required to use the instrument, which combines a microscope, an LCD, and a digital camera in one unit. The microscope is available in two versions. Model 1 offers 0.75-to-4.5x lens magnification and accommodates transmitted and incident light. Model 2 features a quadruple nosepiece and 4x, 10x, 20x, and 40x lens magnification. Both models contain a 2-in. color LCD and a 1/3-in. progressive CCD camera with a resolution of 640 x 480 pixels.

Current Sensors

NK Technologies

Mountain View, CA

A line of switches and transducers monitor powered loads in equipment components such as pumps, fans, and conveyors. Current-operated switches accommodate loads from 1 to 250 A with field-adjustable set points and solid-state outputs. The switches can be connected directly to any automation system input for status and performance proof. The transducers are available for both ac and dc current in split- or solid-core configurations. They can handle loads from 0—10 A to 0—200 A. The KW 2000 power monitors offer high-speed sampling of voltage and current waveforms. The programmable transducers use digital signal processing to ensure high-accuracy measurement and true rms values. The units measure and display power demand and consumption, self-correct for wiring errors, and provide automatic setup.

Vacuum Controller

Hastings Instruments

Hampton, VA

The 760 Plus digital vacuum controller operates at ±0.1% of full scale. The instrument's pressure range is 0.1—999.9 torr, and resolution is 0.1 torr. A four-digit LED and two internal relays rated at 230 V ac, 5 A are standard features. All wetted parts are made of 316 stainless steel. An optional internal switch permits the use of either 110 or 220 V ac.

Perforated Tables

Metro

Wilkes-Barre, PA

Cleanroom tables are made of 14-gauge, 304 electropolished stainless steel with perforations on 1-in. centers. The tables are 30 in. wide and come in lengths of 36, 48, 60, and 72 in. The legs can be adjusted in 1-in. increments from 33 to 40 in. and can accommodate up to 400 lb. Tables with an overhead have 74-in. heavy-duty rear posts. The nonconductive tables can be made conductive with the addition of aluminum split sleeves and a drag cable. Grid panels and cantilever shelves are among the options.

Product Extra!

The MEGAjet mixing system from MEGA Systems & Chemicals blends slurries that are difficult to dispense while maintaining uniform suspension of the abrasive. The unit's unique mixing style eliminates contamination, air infiltration, vibrations, and other problems associated with traditional mixers. Inside the tank, patterned flows are created without mechanical mixing to move the slurry from top to bottom and in a circular motion to clean the tank walls and reduce the chance of buildup. Since the system uses the motion of the fluid to create the mixing energy, there is no vortex motion, contaminating materials, or moving parts. Information: 602/437-9105.

Designed to operate at high productivity and low cost of ownership, Lam Research's TCP 9400PTX high-density poly etch system processes devices with linewidths ¾0.25 µm. The third-generation tool is suitable for advanced polysilicon, polycide, and shallow trench isolation applications. The system, which builds on technology provided by the company's 9400SE model, features a pendulum valve that provides accurate pressure control, low particle counts, high mean time between cleans, and short clean time. The unit comes with removable liners that cover the interior of the chamber and manifold to greatly reduce maintenance. In addition, the tool employs upgraded lower-RF and ESC power supply systems that contribute to higher mean-time-between-failure rates than offered by previous models. Information: 510/659-0200.

Micronova has developed a new cleaning procedure that greatly reduces ionic contaminant levels in the company's vinyl and polyethylene cleanroom tape. For example, an unprocessed roll of vinyl tape may have chloride counts as high as 60 ppb. When processed through the new procedure, chloride counts fall as low as 5.6 ppb. The decontaminating technique also makes it possible to reduce sodium levels from 60 ppb before processing to 3 ppb afterward. With polyethylene tape, which is cleaner than vinyl, chloride and sodium levels can be reduced to as low as 1.4 and 0.79 ppb, respectively. The patent-pending method is being implemented on the company's CR100 PC and PCX tapes used for cleanroom packaging, wafer box sealing, and labeling applications. All cleaning and bagging for the process is done in a Class 10 cleanroom. Information: 310/784-6990.

Dionex offers ion chromatography and liquid chromatography techniques for monitoring and optimizing copper plating baths. Suitable for monitoring plating bath brighteners, ductilizers, dispersants, carriers, levelers, and degradation products, the company's instrumentation can be used to analyze contaminants, additive concentration, and individual components in acid copper baths and other applications. Information: 408/737-0700.

Tantalum-silicide sputtering targets from Tosoh SMD provide effective barriers to copper interconnects in advanced semiconductor devices. Made using proprietary processing and consolidation techniques, the Ta-Si targets produce amorphous Ta-Si-N films that have higher thermal stability than Ta-N films. Available for 200- and 300-mm PVD systems, the targets feature a consistent, ultrafine-grain micro-structure with controlled high density and low impurity level. Information: 614/875-7912.

A one-year study conducted by Rudolph Technologies indicates that cleaning may be required before using a reference wafer for film-thickness metrology tool calibration and system matching. The company investigated the film-thickness stability of thin SiO^₂ films on silicon that are used to calibrate and cross-calibrate film-thickness metrology systems. While performing tests using its Model 436 research-grade ellipsometer, the company monitored the thickness of a thin oxide and the dynamics of what appeared to be a contaminant layer that forms on the oxide surface. The data showed that an oxide film grows rapidly on a bare silicon surface, increasing at about 0.2 Å per month. The research also indicated that the slow thickness increase is not solely due to diffusion-limited oxide growth, but is caused by what may be airborne molecular contaminants adsorbing onto the oxide surface. The results suggest that the reference wafer should be cleaned before use.

Pick of the Literature

The following companies are offering free literature:

BFGoodrich Static Control Polymers, Stat-Rite thermoforming guide. Information: 330/425-1643; fax, 330/425-9254.

Compressed Gas Association, 1998 safety standards and specifications catalog. Information: 703/412-0900; fax, 800/827-5242.

Desco, antistatic wrist strap brochure. Information: 909/598-2753; fax, 909/595-7028.

GLI International, analytical instrumentation catalog. Information: 800/454-0263; fax, 414/355-8346.

Interconnect Devices, coaxial probes catalog. Information: 913/342-5544; fax, 913/342-7043.

Liberty Industries, cleanroom products catalog. Information: 800/828-5656; fax, 860/828-8879.

Materials Research Society, 1998 publications catalog. Information: 412/779-3003; fax, 412/779-8313.

Memtec Electronics, Varafine Zeta series filter cartridges brochure. Information: 800/345-8377; fax, 410/560-2857.

Plast-O-Matic Valves, miniature diaphragm seal/gauge guard catalog. Information: 201/256-3000; fax, 201/256-4745.

Porta-Fab, modular in-plant buildings catalog. Information: 800/325-3781; fax, 314/537-2955.

Simco, Ionization and the Semiconductor Industry booklet. Information: 800/538-0750; fax, 215/997-3450.

Thornton, 200 series process control instruments and sensors catalog. Information: 800/642-4418; fax, 781/890-5507.

Victor Associates, data sheets for manual and automated wet process stations. Information: 215/443-5664; fax, 215/443-5666. VLSI Standards, 1998 product guide. Information: 408/428-1800; fax, 408/428-9555.

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