Defect Review SEM

Applied Materials

Santa Clara, CA

Made for use with sub-0.25-µm processes, the SEMVision in-line microscope automatically classifies up to 300 defects per hour. The system uses a proprietary technology to provide enhanced topographic information and automatic classification of defects into types closely linked to their source. The instrument can be used with a range of patterned wafer inspection tools, including the supplier's WF-73X-series systems. Features such as tilt, rotation, and energy-dispersive x-ray (EDX) spectroscopy are available for operating the system as an engineering tool for rapid defect source identification and process development characterization. The EDX option is designed to provide nondestructive defect material analysis in <20 seconds at an SEM beam condition of 5 keV. (Semicon West, San Francisco, South Hall, Booth 1026)

RTP System

AG Associates

San Jose, CA

The Steampulse RTP system is designed to strictly control thin-oxide uniformity. The system is suitable for use with postdielectric deposition anneals, selective oxidation, and low-temperature metal anneals in the production of submicron devices. Offering both catalytic and pyrogenic processing capabilities, the tool has a ramp rate of >200°C/sec. A small footprint and high uptime are standard features. (Semicon West, San Francisco, North Hall, Booth 6344; South Hall, Booth 617)

Automated Inspection System

Electroglas
Santa Clara, CA

The QuickSilver postfab inspection system features high throughput, automated detection and classification of visual defects, and precise measurement of critical device dimensions on patterned wafers. Product line applications include MEMS, bump defects in 2- and 3-D, microstructures, and other sort-floor inspection needs. The tools can be used for data acquisition to provide essential information for high-level process management and yield analysis systems. Time-delay integration imaging capabilities automate and accelerate wafer handling, inspection, and storage of inspection data for use by other systems. Enclosed in a Class 1 minienvironment and equipped with dual-cassette robotic handling, the system can handle wafers up to 200 mm. Resolution sensitivity is 0.5 to 5 µm with precision from 0.25 to 2.5 µm. (Semicon West, San Jose, McEnery Center, Booth 11221)

Chemical Disconnect Couplings

Colder Products

St. Paul, MN

ChemQuick CQH series couplings can be instantly disconnected during the transfer of fluids such as aggressive chemicals and ultrapure water. Made of polypropylene, the couplings accommodate a variety of chemicals and acids, making them suitable for applications such as CMP filter service. The noncontaminating couplings can also be used in DI-water cooling lines and DI-water resin bottles. Their nonmetallic flow path eliminates contamination caused by reaction to metals and chemicals. An audible click indicates a secure connection. A thumb latch for single-handed disconnections and an automatic high-flow shutoff valve are standard features. The couplings tolerate operating pressures from 0 to 80 psi, and temperatures from 32° to 150°F ambient and from 32° to 225°F fluid. Nominal flow diameter is 3/8 in. Both in-line and sealing panel mounting options are available. (Semicon West, San Francisco, South Hall, Booth 301-12)

Wafer Inspection System

Carl Zeiss

Jena, Germany

The automated Axiospect consists of a microscope, wafer station, and handling robot. Designed to detect and classify defects on in-process wafers, the system, which incorporates a SMIF box and UV optics, can be used with 300-mm wafers. (Semicon West, San Francisco, North Hall, Booth 5514)

OCR Controller

CiMatrix

Canton, MA

The MX-1500 symbology and optical character recognition controller decodes and automatically reads up to 1500 one- or two-dimensional texts or OCR codes per minute. The system can support eight independent cameras capable of reading any symbology in a range of semiconductor manufacturing applications. Application-specific symbologies supported by the system include DataMatrix, PDF417, OCR, and 1-D bar codes. The system also accepts user-supplied OLE-compliant applications written in languages such as Visual Basic or C++. It can be connected to a PC with Ethernet or RS-232. (Semicon West, San Francisco, North Hall, Booth 5535)

Bulk Facility Valve

Veriflo

Richmond, CA

Assembled and tested in a Class 10 cleanroom, the SuperFlow BFV 1.00 valve controls bulk gases at a high flow coefficient. A MultiPhragm diaphragm replaces the traditional bellows design. The diaphragm is made from Hastelloy C-22 for corrosion resistance, smooth surface finish, and long cycle life. The body is made of a low-sulfur, high-purity 316L stainless steel. Flow capacity is 99% of an equivalent length of straight tubing. An open/close safety indicator shows when the valve is unseated. (Semicon West, San Francisco, South Hall, Booth 1319)

Shaft Seals

Bal Seal Engineering Co.

Santa Ana, CA

The canted-coil spring in U-shaped polymer BAL seals maintains a near constant load despite changes in deflection caused by temperature variations, uneven loading, and seal wear. This attribute enables the components to maintain initial breakout, running friction, and sealing capacity. Made of a low-particulating Teflon PTFE compound, the seals are self-lubricating and wear resistant. They can be integrated in wafer-handling robotics and used as an alternative to metal bellows and ferrofluidics seals. The seals come in sizes from 0.020 to 77 in. diam and in cross sections from 1/64 to 1/2 in. Operating range is vacuum to 100,000 psi; temperature range is —450° to 500°F. (Semicon West, San Francisco, North Hall, Booth 5355)

Polymer Removers

Silicon Valley Chemlabs

Sunnyvale, CA

Pr_x-400 strippers are designed to dissolve hardened inorganic polymers from DPS, TCP, and ECR etchers up to three times faster than conventional strippers. The chemicals operate at temperatures of 30° to 50°C and provide wide process latitude. They can be used in standard plasma etch processes for aluminum interconnects as well as
for copper and low-k dielectric dual-damascene applications. The formulations are free of hydroxylamine, phenols, phenol derivatives, ethylene, propylene glycols, HF, NH₄F, and high-alkaline solutions. They will not attack soft metals such as copper, aluminum, titanium, and tungsten. No modifications to installed process tools are required. All strippers are shipped in low-particulate containers. (Semicon West, San Francisco, Esplanade, Booth 4122)

TOC Analzyer

Thornton Associates

Waltham, MA

Unlike batch-measurement tools, the 502P analyzer continuously monitors TOC on-line in pure and ultrapure water. The instrument requires no acids, gases, or other reagents for maintenance. The system measures TOC based on the differential resistivity/conductivity method. Measurement range is 0—500 ppb at resistivity >1 M‡-cm and 0—2000 ppb at resistivity of 0.05 M‡-cm. The tool accommodates a sample water temperature range of 41° to 131°F. A high-temperature option is available. Sample flow rate is ¾75 ml/min. The entire measurement process takes 15 seconds at the maximum flow rate. (Semicon West, San Francisco, Esplanade, Booth 4442)

Vacuum Measurement System

Granville-Phillips

Boulder, CO

Compatible with existing Convectron gauges, the Series 375 Convectron vacuum measurement system operates at a range of 1000 to 1 x 10^—4 torr. The system's all-metal package withstands RF interference. Options include process control set points as well as RS-232 or RS-485-422 digital interfaces. The system has a 1/8 DIN size. (Semicon West, San Francisco, South Hall, Booth 1709)

Thermal Processing System

MRL Industries

Sonora, CA

The four-tube Cyclone system permits a choice of 3/4-in. and 4/5-in. flat zones for processing 150—200-mm and 300-mm wafers, respectively. Suitable for both low- and high-temperature applications, the system integrates PC-based process control for precise temperatures from 200° to 1300°C. The tool incorporates a horizontal-laminar-flow in-line load station with atmospheric cantilever assemblies for clean, automatic wafer loading. Elements are mounted on slides to facilitate removal, and hinged doors and bottom panels allow easy access to internal components. Source cabinet components are mounted on slides for access during rear tube pull. The system configuration matches existing fab equipment, and its floating frame design eliminates the chance that pads could shear during movement or installation. (Semicon West, San Francisco, South Hall, Booth 1326)

Concentration Monitor

Daitron

Wilsonville, OR

The Kurabo ChemicAlyzer concentration monitor provides precise monitoring and accurate measurements of concentration levels of HF, H^₂SO^₄/ H^₂O^₂, and other solutions. The monitor comes in a portable wagon-style configuration that can be moved from bath to bath, making it possible to measure multiple solutions with a single unit. An in-line pro-style model, designed for use with a single bath, communicates data to the tool for possible concentration control. A high-precision CE-style configuration is also available. (Semicon West, San Francisco, Gateway, Booth 3311)

Deep-UV Reticle Inspection

KLA-Tencor
San Jose, CA

The 353UV is an automated, UV-based reticle inspection system combining 150-nm sensitivity and an enhanced software and algorithm package. Designed for pattern verification and process development for 0.18-µm geometries and beyond, the latest model of the company's 300-series platform detects critical, wavelength-specific defects on binary, optical proximity correction, and phase-shift photomasks. The system can zero in on incorrectly sized geometries, transmission errors, critical dimension disuniformity, and other defects that could lower wafer yields in advanced UV and deep-UV processes. Inspection information can be used in either a die-to-die or die-to-database manner and integrated into a reticle quality management program. (Semicon West, San Francisco, South Hall, Booth 426)

300-mm Wafer Inspection

Inspex

Billerica, MA

The Eagle combines darkfield illumination and real-time image processing to detect and classify defects on wafers 300 mm and smaller. The system's oblique darkfield illumination capability makes it suitable for use in postetch and CMP applications. The dark-field feature enables the system to differentiate between killer and nuisance defects. (Semicon West, San Francisco, South Hall, Booth 1526)

Ozone Control System

IN USA

Needham, MA

The Model SCI-Mux monitors and controls ozone in both gas and liquid phases. The system connects with up to four ozone sensors simultaneously. It can be used with the suppliers' Model gFFOZ sensor for in situ measurement of process ozone to 400 g/m³ and with the Model dFFOZ sensor for measurement of dissolved ozone to 100 mg/L. The sensors can be used in any combination. A microprocessor and nonvolatile memory permit storage of user-programmable parameters such as alarm thresholds and servo-control set points. The system suits CVD, etch, FPD, and ultrapure-water applications. (Semicon West, San Francisco, North Hall, Booth 1561)

Diaphragm Valve

Furon

Laguna Niguel, CA

Assembled and double-bagged in a Class 100 cleanroom, the CDV-1000 valve has a fully swept flow path made
of totally inert virgin PTFE and high-purity PFA. The valve has a 1/2-in. orifice, leak-detection port, visible position indicator, and no exposed metallic parts. End connections include JPT, Flowell, and fine thread flare. The valve comes in two-way pneumatically operated, two-way manual multiturn, and two-way manual toggle designs. The manually operated toggle can be used as a master isolation or POU isolation valve. The pneumatically actuated model has a pilot air port that may be placed in any quadrant for flexibility of design. The valve is suitable for process, high-purity, and corrosive chemical applications. (Semicon West, San Francisco, South Hall, Booth 1510)

Digital Mass-Flow Controllers

Unit Instruments

Yorba Linda, CA

Model 1661 and Model 8161 digital mass-flow controllers perform multiple gas calibrations at an accuracy of ±1% set point at the three signal limits. FlowChart GUI software permits users to perform diagnostics and real-time data tracking from a PC or laptop computer. Models are available for applications with flows of 5 std cu ft/min to 30 std L/min. Both models feature the Cross-Flow minisensor design, which minimizes thermal siphoning effects. The Model 1661 features a 16-µin.-Ra surface finish, while the 8161 has a 4-µin.-Ra surface finish. Leak integrity for both MFCs is 1 x 10^—10. (Semicon West, San Francisco, South Hall, Booth 1001)

Mobile Gas Analysis

Trace Analytical

Menlo Park, CA

Designed for rapid and reliable gas certification, the Millennium GS is based on the RGA5 process gas analyzer for monitoring H₂, CO, CO₂, CH₄, and nonmethane hydrocarbon impurities. The system combines the RGA5 with the MGB 100 micro gas blender to offer calibration, UHP sampling, and an automatic safety capability. The system's uninterruptible power supply maintains the standby status of the instrument during transit between locations. On-board hydrogen and zero-air generators supply support gases and eliminate the need for storing gas cylinders. (Semicon West, San Francisco, Esplanade, Booth 4005)

Flow Switch

Autoflow Products

Gardena, CA

The FS6200-series flow switch precisely detects increasing or decreasing flow rates of gases in critical processes. Operating temperatures range
is from —40° to 300°F. Construction materials include corrosion-resistant 316 stainless steel, Monel, and Hastelloy C-276. Operating pressure is 300 psig. The microswitch can be used in critical purge monitors and process analyzer sample-conditioning systems.

Perfluoroelastomer

Greene, Tweed & Co.

Kulpsville, PA

Chemraz 653 compound is designed to retain its sealing properties at temperatures ¾316°C. Seals made of the perfluoroelastomer are suitable for bell jar, door, and quartz tube sealing areas of diffusion furnaces and ovens. (Semicon West, San Francisco, South Hall, Booth 124)

Noncontact Laser Sensor

Selcom/DynaVision

Southfield, MI

Suitable for precision measurement of wafer surface roughness, a noncontact laser nanosensor has a measuring range from 8.8 to 300 µm and an accuracy better than 0.5% of the measuring range. The sensor's autofocus principles give it a resolution down to 5 nm and a frequency response rate up to 300 kHz. The unit measures 21/2 in. long and 8/10 in. diam, and it operates in temperatures of 32° to 120°F. Cable length is 81/4 ft. Four models are available.

ESD Event Detector

Lucent Technologies

Princeton, NJ

The Model T-100 detects RF signals generated by ESD events and shows the number of events on a digital display. The instrument can detect events within a 30-ft radius and as closely spaced as 100 nanoseconds. An LED alarm and an audible alarm indicate when an event has been detected. Users can establish a set point for a minimum number of ESD events to trigger the alarm.

Product Extra!

KLA-Tencor's Klarity 1.0 automated module enables the company's defect analysis hardware to perform time-saving decision-making processes that eliminate the need for manual engineering analysis. The module is an enhancement to the Quest defect data management system, which automatically collects defect data from multiple sources throughout the fab. In contrast to manual analysis methods, the Klarity's decision-flow analysis recipes automatically perform complex analyses to quickly flag out-of-control conditions and identify defects. The rapid resolution of yield problems gives fab engineers more time to focus on other critical issues. Information: 408/875-3000. (Semicon West, San Francisco, South Hall, Booth 426; San Jose, McEnery Hall, Booth 11001)

Varian's Remote Assist service uses videoconferencing technology to link customer fabs with its support offices and facilities. The virtual service employs videoconferencing software and a video helmet that comes with a video camera, eyepiece display, microphone, and earphone. As a PC runs the software, an on-site engineer can tour the implanter hands-free while sending audio and video of the problem area to experts in another location who can transmit assembly drawings and other electronic documentation to the helmet's eyepiece monitors. In contrast to costly, time-consuming on-site visits, the company says, videoconferencing allows efficient preventive maintenance and support as well as quicker problem identification and resolution. These benefits can lead to an increase in ion implanter uptime and cost reductions. Information: 650/424-5997. (Semicon West, San Francisco, South Hall, Booths 626, 716)

3P has developed a bonding process for applying a corrosion-resistant lining to the interior surface of containers to protect tanks and vessels from the ultrapure and highly corrosive chemicals they transport. The bonding process for applying a fluoropolymer sheet lining makes it possible to reduce the number of welded seams on the lined surface. Reducing the number of welds minimizes the potential for liner failure, and therefore makes the product more reliable. Fluoropolymer sheets are available in such materials as PFA, PTFE, PVDF, and HDPE. Information: 713/690-4800. (Semicon West, San Francisco, South Hall, Booth 630-1)

A retrofit version of Fab-m's CX-2 ion-beam scan controller compensates for tilt and planar effects and enhances dose uniformity for both end-stations to below measurable limits for geometries ¾0.35 µm. The company says use of the controller has been shown to both increase die yield at least 7% and provide a 90% increase in Class One—grade yield at final test. The unit, which is installed at Ion Implant Services, Philips, NEC, and other facilities, can be set up in 60 seconds and has an implant time of 2 seconds. Designed to fit several Varian implanter models, the controller is guaranteed to increase die yields by at least 5% and is covered by a drop-in two-year warranty. Information: 415/567-8504.

A TEOS sensor from EIT demonstrates the company's electrochemical sensor technology. Now available for EIT's Model 4500 SensorStik, the user-friendly TEOS sensor features rapid response and a small footprint. In addition, its alarm activates at lower levels than pyrolyzer and ionization-type detectors, and the device does not require heated filaments or sample pumps. Information: 610/363-5450. (Semicon West, San Francisco, Esplanade, Booth 4215)

Gas Tech's GT-2400 gas monitor features a peak hold mode that enables the tool to display and retain the highest values of gas (lowest for oxygen) encountered, including alarm conditions that have occurred. While in the peak hold mold, the letter p will flash on the display. If any alarms are encountered during the mode, the LED and the display will flash and a buzzer will start pulsing. Once the reading drops below the alarm setting (above it for oxygen), the LED and display will continue to flash, but the buzzer will stop. The peak value is retained until the monitor is reset. Information: 510/745-8700. (Semicon West, San Francisco, Esplanade, Booth 4245)

Pick of the Literature

The following companies are offering free literature:

• AlliedSignal Specialty Chemicals, general capabilities brochure. Information: 973/455-4322; fax, 973/455-5000.

• Carl Zeiss, UV—Axiotron 2 for semiconductor defect inspection brochure. Information: +49 36 41 64 2563 or 800/233-2343; fax, +49 36 41 64 2938.

• CEA Instruments, toxic and combustible gas monitors product guide. Information: 201/967-5660; fax, 201/967-8450.

• Desco, ESD control products catalog. Information: 909/598-2753; fax, 909/ 595-7028.

• Dionex, determination of trace anions in organic solvents application note. Information: 408/ 737-0700; fax, 408/730-9403.

• EGC, polymeric pump and compressor components brochure. Information: 800/342-7677; fax, 281/774-6201.

• ESD Systems, ESD control products catalog. Information: 508/ 485-7390; fax, 800/805-5665.

• Perkin-Elmer, ICP-OES tutorial booklet. Information: 800/762-4000; fax, 203/762-4222.

• Prior Scientific, defect review system brochure. Information: 800/ 877-2234; fax, 781/878-8736.

• Seradyn, particle technology product catalog. Information: 800/428-4007, ext. 2956; fax, 317/266-2991.

• Silicon Valley Chemlabs, products and capabilities brochure. Information: 408/732-4700; fax, 408/ 732-0733.

• U.S. Filter, wastewater treatment brochure. Information: 724/772-0044; fax, 724/772-1360.

• Watlow Electric, controllers catalog. Information: 314/878-4600; fax, 314/878-6814.

• Worcester Controls, Series 71 high-pressure ball valve brochure. Information: 508/481-4800; fax, 508/481-4454.

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