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Spin Coating Valve
EFD
East Providence, RI
The adjustable fluid flow control and end-of-cycle snuffback features of the Model 725DA-SS valve eliminate drips in spin coating applications. A stainless-steel fluid chamber, an inert polymer diaphragm, and sealing head isolate the actuator from wetted components to ensure trouble-free cycles. Compact and light, the valve is suitable for installation in automated assembly machines and robotic equipment. Deposit volume is accurate to ensure consistent film thickness on each wafer. Rapid, clean coating cutoff is designed to eliminate streaks. Dispense tips are available in different styles and sizes.

XRF Wafer Analyzer
Philips Analytical
Almelo, The Netherlands
Suitable for use with 300-mm wafers, the automated PW2830 x-ray fluorescence analyzer determines layer composition, contamination, stoichiometry, thickness, dopant levels, and surface uniformity for a wide range of process films. The automatic instrument processes up to 15 wafers per hour using a 4-kW Super-Sharp tube and specially designed high-performance channels. These features permit rapid measurement of critical light elements such as boron and nitrogen. The instrument checks process steps such as BPSG, metals, silicides, salicides, nitrides, and dielectrics. The ceramic x-ray tube has a stainless-steel outer plate for extended operating life. Oil-free pumps ensure a clean subpascal vacuum in the measuring chamber, minimizing the risk of carbon contamination on reference samples. Uptime is >98% and MTBF is >1000 hours with a transfer rate of >50,000 wafers without failure. After alignment, the wafer remains oriented constantly for spot measurements at all points on its surface. In addition to FOUP, loading options include cassette and manual operation. The system's 20 fixed measuring channels can be customer specified, and an integrated control PC has a touch screen program to simplify routine operations.

Defect Detection System
Hologenix
Huntington Beach, CA
The PBS-1000 Fast Mapper maps the level and distribution of subsurface defects in silicon and gallium arsenide materials. The system can map 8-in. wafers in 15 minutes at a scattered light detection level of 0.001 ppm/sr. In addition to defects caused by polishing, cleaning, and lapping, the system detects deposition-related flaws and defects introduced during processes such as ion implantation.

Pressure Regulator
Valcor Engineering
Springfield, NJ
Suitable for use with DI water, the Model SV100 liquid pressure regulator operates in temperatures 250°C. The regulator's adjustment knob can be set manually to determine or change the downstream pressure. All wetted components are made of virgin Teflon to minimize contamination, corrosion, and clogging. Other models feature a polypropylene body and various diaphragm elastomers, or both. Regulated outlet pressure is 1560 psig. Other models offer outlet pressures of 0 to 40 psi and 5 to 100 psi. The regulator can be used for wafer cleaning and other high-purity applications.

TOC-Certified Products
Eagle-Picher Technologies
Miami, OK
TOC analysis products certified to <10 ppb include TOC-free specialty water. Quality is consistent from lot to lot, minimizing errors that can lead to costly retesting and improving efficiency during cleaning validation by TOC. Vials can be used with Sievers Instruments' Models 800 and 400 analyzers. The one-piece cap will not fall out during sampling.

Copper Plating Process
CirQon
Gurnee, IL
An economical alternative to thin-film sputtering, plated and bonded copper (PBC) on ceramic is a pure-metal copper plating process that produces fine lines. PBC features 96% alumina, while thin-film processes contain 99.6% alumina. The process is particularly suited for making hybrid power amplifier circuits. The technology uses photolithography to produce well-defined patterns and fine lines of thick, pure copper with high thermal dissipation and size density comparable to thin-film processes. Solid-filled pure-copper vias measure 7 mil diam.
Lubricating Oil
Castrol Industrial North America
Downers Grove, IL
Clear and odorless, MicroSoak 356 coats lip seals on the reciprocating shafts of wafer fab equipment to prolong seal expansion and eliminate the need for constant relubrication. The oil does not evaporate at 180°C in vacuum. Because it is nonflammable and chemically inert, the oil offers thermal stability and low outgassing properties. It will not degrade in strong acids or bases. Shear stability and a low order of acute toxicity are additional benefits. The oil comes in 3-cm3 syringes and 2-oz bottles.
UHV Shield Coating
Aerospace Coating Systems
Berlin, CT
Specially formulated for use in PVD etch chambers, ACS EG-28 coating increases the surface area and raises the surface roughness of an etch shield. This treatment makes each shield able to hold and contain extraneous particulates for a long time, extending the operation of a PVD etch chamber from approximately 900 to 12,000 cycles before a replacement shield is needed. The coating can then be stripped off the then original shield and reapplied. The coating can also be customized to suit specific applications.

Chillers
Bay Voltex
Livermore, CA
HT-2450-WC-DC-G single- and dual-chamber chiller systems are plug compatible with etchers made by Lam Research and Applied Materials. Systems for circulation of DI water or Galden/Fluorinert fluids are available. Magnetically coupled gear pumps and an O-ringbased seal system for leak-free operation are standard features. The chillers operate in temperatures of 20° to 100°C. All systems are SEMI-S2-93 and CE certified.

Gas Cylinder Cleaner
Telsonic Ultrasonics
Bridgeport, NJ
The Tube Resonator uses only water to clean the inside of any gas cylinder. The tube is simply inserted into a cylinder filled with water. The system generates a multidirectional field of ultrasonic energy throughout the liquid in the cylinder. Bubbles caused by ultrasonic cavitation scrub contaminants from the cylinder wall. The system cleans even the smallest crevices inside the cylinder. Frequency range of the system's generator is 20,00021,000 Hz. The resonator tube is made of titanium and stainless steel and operates at a frequency of 20 kHz. Length ranges from 9 to 70 in., and the tube can fit into cylinders with 3/4-in. openings.

Moisture Analyzer
Meeco
Warrington, PA
The NastyBoy detects water in chlorine and other process gases to prevent corrosion in valves, piping, seals, and related process components. The corrosion-resistant flow system is made of Kynar and Teflon. The instrument's two-wire, loop-powered transmitter is housed in a dual NEMA 4* assembly that protects the flow system and electronics. Its electrolytic technology is designed to provide accurate, calibration-free measurements.
Inert Gas Purifiers
Valco Instruments
Houston, TX
HP2 and NP2 purifiers use a universal input 24-V-dc power supply, making them inherently safe for removing impurities at the point of use. The HP2 helium purifier removes impurities such as H2O, O2, NO, and NH2 at a 10-ppb rate based on 10-ppm total inlet impurities. Incoming power input is stable, and temperature has been optimized for the range of components used with helium, argon, and nitrogen carrier gases. The purifier's self-regulating heater cartridge reaches its operating temperature within 21/2 hours at a constant current draw. The purifier's getter cartridge is replaceable without disassembly of the heater which could cause damage to heater or sensor wires. Changeout takes approximately 2 minutes.
Multigas Monitor
Draeger Safety
Pittsburgh, PA
The MiniWarn's alarm indicator and loud horn immediately notify the user of the presence of oxygen, toxic, and combustible gases. The instrument is housed in a light, rugged case to fit in the hand or on the belt. The instrument's battery powers a small, attachable sampling pump, and the user can choose from 20 different sensors. The monitor operates on alkaline, nickel-cadmium, or NiMH batteries. A datalogging function enables users to customize the monitoring program. The company's new sensor technology enables the monitor to retain all calibration data. The sensor technology carries a 3-year warranty and requires only yearly calibrations.
Product Extra!
Lam Research has released dual-damascene applications for its 4520XLE advanced dielectric etch system. The tool can be used for critical via and trench etching in processing dual-damascene structures on chips with linewidths 0.25 µm. The system's independently controlled power settings regulate charged particle flux and energy within a broad range of operating pressures. The tool runs high-pressure processes in situ, including photoresist strip and nitride finish etch. The in situ capability can lower overall cost per wafer. Information: 510/572-4538.
Fluoroware's system applications and products (SAP) client/server program replaces the supplier's enterprise resource planning system. SAP's six software modules are sales and distribution; materials management; vendor; production planning; product data management; and finance and control. The integrated system offers real-time exchange of information for ordering and delivery. Information: 612/448-8193.
Implanter Network Options from Eaton's semiconductor equipment operations are designed to maximize the use of engineering time and increase overall fab efficiency. A dedicated network option can connect more than 200 Eaton high-energy, high-current, or medium-current implanters in any combination through a dedicated LAN. An in-house network option uses the fab's existing LAN, or the option can be used with the dedicated network capability as a single enhancement. The implanter program allows both process and maintenance engineers to edit recipes and access data from locations away from the fab floor or from the machine's primary operator interface. Information: 978/ 232-4000.
Osmonics's customers can now order laboratory microfiltration products on the Internet. The supplier's Web site, www.osmolabstore.com, features a filter selection guide designed to help visitors rapidly identify comprehensive filter attributes, applications, and chemical compatibility requirements. A technical library contains more than 100 documents with information on specific products and applications. Orders totaling more than $250 are shipped free. Information: 877/LAB-STORE.
WonderLink software from Foxboro integrates real-time data from the company's advanced I/A-series intelligent automation system into Wonderware's InTouch human/machine interface software. In plants equipped with I/A-series programs the new software program provides engineers and managers with process graphics and global alarms on their personal computers. WonderLink also works with Wonderware's Scout Web browser. Information: 888/FOXBORO.
General Chemical's electronic chemicals group has introduced an ultrahigh-purity nitric acid as part of its Class 1 semiconductor chemical line. The new grade meets sub-parts-per-billion specifications. It also will be used in the group's MAE mixed oxide etchants and PAE aluminum etchants. The supplier developed the chemical for processing chips with sub-0.35-µm features. Information: 800/247-4519.
Furon's Product Express program promises shipment of fluid-handling products in stock within 24 hours. Customers must first phone 800/GO-FURON to receive a program diskette containing more than 500 stock and assembly stock products. They can then call Furon or one of its distributors to place an order. Assembly stock products are shipped within 10 business days. Stock products are finished items available for immediate shipment. Assembly stock products are assembled by Furon in configurations to meet customer needs. Information: 714/ 630-6068.
DART Version 2.5 software from Nikon is an enhanced version of the DART inspection, defect review, and analysis program for semiconductor manufacturing. Compatible with all Windows NT platforms, the updated program is used with Nikon automated inspection tools to help operators locate, evaluate, and classify defects at any stage in the manufacturing process. The software complies with GEM/SECS standards, and it supports optical character recognition, DART image archiving, image retrieval, and wafer mapping. It can also be used with automated defect detection tools made by KLA-Tencor and other manufacturers. Information: 800/52-NIKON, ext. P8076.

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© 2007 Tom Cheyney
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