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Wafer-Handling RobotAsyst Technologies Fremont, CA
The Titan robotic platform is designed to meet the reliability, repeatability, and durability needs of advanced IC manufacturing in 200- and 300-mm fabs. Features include brushless motors that eliminate failure and maintenance modes, backbone frame, and linear bearing assembly for high accuracy and repeatability. The robot also has monolithic tubular arm links and a rotating-mast drive coupled with software capabilities that enable optimal path planning with minimal mechanical complexity and lost motion. The modular system can handle harsh processing environments associated with CMP and copper deposition. It also satisfies new requirements created by complex wafer-transport mechanisms, intricate wafer paths, and larger wafers. The system's simple design gives it the adaptability to accommodate expected advances in wafer process automation. (Semicon West, San Francisco, South Hall, Booth 1338)
Dielectric Etch SystemLam Research Fremont, CA
The dual-frequency Exelan dielectric etch system for processing 0.18-µm devices has a streamlined design that features a single RF power supply and fixed-gap chamber that minimize components. Hard-mask opening, inorganic and organic ARC etching, and photoresist stripping are performed in situ within a single chamber. The system's process portfolio includes all dual-damascene structures, contacts, vias, spacers, and passivation etch in doped and undoped oxides and low-k
CD-SEMKLA-Tencor San Jose, CA
The 8100XP-R CD scanning electron microscope addresses the metrology requirements of low-k1 lithography and
CVD Process MonitorMKS Instruments Andover, MA
The Orion process monitor, employing quadrupole mass spectrometry, is designed for copper CVD processes. Continuous on-line monitoring of such processes, for which the system has been extensively tested to 5 torr, maintains repeatability and controls process drift. The monitor's Unibloc integrated inlet uses Auto-Purge when idle, preventing contamination of the mass analyzer, minimizing sensor drift, and providing repeatable data. Orion process-monitoring software includes wafer-position signal and multievent gas-specific alarms. The system can be integrated with a process tool controller by means of an SECS-II or GEM interface. (Semicon West, San Francisco, South Hall, Booth 1616)
Piping SystemAsahi/America Malden, MA
A line of pipes, valves, fittings, gaskets, and flowmeters, the Purad high-purity piping system can be configured to suit a particular ultrapure-water operation. The line features pipes measuring 1/2 to 12 in. diam, flowmeters from 1/4 to 9 in., and a selection of fittings in many sizes. Components are made of high-purity Solef PVDF resin, and all valve bodies and fittings are rinsed in a six-basin automated hot-DI system. Specially angled zero-dead-leg valves are available in 35 size configurations ranging from 1/2 * 1/2 in. to 4 * 2 in. Corrosion-resistant all-plastic Universal Vortex and ultrasonic FloSonex flowmeters have no moving parts. Diaphragm valves measuring 1/2 to 4 in., ball and swing check valves, and Teflon-bonded gaskets are also offered. Automated infrared welding equipment for contamination-free, repeatable welds and 3-D CAD software for accurate pipe layouts are available with the Purad line. (Semicon West, San Francisco, South Hall, Booth 120)
Vacuum WandVirtual Industries Colorado Springs, CO
A portable self-contained system, the Porta-Wand is designed to handle semiconductor wafers securely. The ergonomically designed wand is ESD safe and suitable for use in Class 1 cleanrooms. The continuous-vacuum, hoseless system features intake and exhaust filters for replacement air. The wand discharges exhaust at the opposite end of the tool from the wafer. It comes complete with a molded wafer tip, and additional tips are available in several sizes. Power is supplied by an internal 9.6-V NiMH battery pack that provides 3 to 4 hours of continuous operation per charge. An indicator flashes when the battery is low. Full recharging in a 24-V-dc stand takes 2 hours. (Semicon West, San Francisco, North Hall, Booth 5236; San Jose, McEnery Hall, Booth 12018)
Yield Management SoftwareIDS Software Systems Foster City, CA
The dataPOWERsc suite of platform-independent software tools for semiconductor yield management and statistical analysis is available in Y2K-
ICP-MSPerkin-Elmer Norwalk, CT
The ELAN 6100 DRC inductively coupled plasma mass spectrometer eliminates argon-species interferences, making possible the detection of iron, calcium, potassium, and arsenic in semiconductor-grade chemicals. Detection levels are parts per trillion and parts per quadrillion. Proprietary dynamic reaction cell technology reduces primary interferences and eliminates sequential side reactions that can create isobaric interferences. Plasma-based polyatomic species are removed before they can enter the quadrupole mass spectrometer. Using a normal plasma, the spectrometer avoids the disadvantages of cool- or warm-plasma approaches. It also provides multielement analytical efficiency and high sample throughput. The cyclonic sample-introduction system minimizes contamination to permit accurate elemental measurements at extremely low levels. Windows NT—based software provides automated control of the reaction cell. (Semicon West, San Francisco, Esplanade, Booth 4141)
Wafer Inspection SystemTopcon Technologies Paramus, NJ
A universal defect classification system for 6- to 12-in. wafers, the WM-2500/3000 has 0.06-µm sensitivity. It features simultaneous acquisition of multiple laser signals, which facilitates identification and separation of crystal-originated particles (COPs), other particles, and scratches. The high-throughput system distinguishes COPs from other particles with up to 98% accuracy. For determining defect locations, special hardware and software ensure high x-y positional accuracy even on wafers with varying thickness or with warping and bowing. A Windows NT platform is standard, permitting the transfer of data to the host computer in TFF format. (Semicon West, South Hall, San Francisco, Booth 2402)
Benchtop Plasma SystemsAST Products Billerica, MA
The PS-35 and PS-38 benchtop plasma processing systems perform cleaning, etching, stripping, ashing, and surface treatment without the need for wet chemicals. The processors offer interchangeable Pyrex or quartz chamber modules under a common PLC system. The PS-35 measures 5 * 8 in.; the PS-38, 8 * 8 in. The control system stores up to 14 procedural programs and provides fixed-flow or mass-flow-control gas input. The PS-38 features automatic RF match for complex engineering programming. The processors are designed to handle complicated cleaning and surface modification tasks within different configurations. (Semicon West, San Francisco, North Hall, Booth 6676)
300-mm Cluster ToolBalzers Process Systems Balzers, Liechtenstein
The Clusterline 300 PVD metallization cluster tool for 300-mm applications has a system layout based on that of the 200-mm Clusterline model and is designed to be as reliable as the smaller system. Field-proven components integrated in the 300-mm tool include the handling robot, process elements, and the PC-based ControlWorks system software. (Semicon West, San Francisco, South Hall, Booth 2416)
Pneumatic Diaphragm ValvesGeorge Fischer Tustin, CA
The +GF+ Diastar family of pneumatically actuated diaphragm valves has added sizes of 1/2 to 2 in. diam. The available size range of the regulation and control valves for neutral or aggressive media is 1/2 to 6 in. diam. Valve bodies are made from PVC, CPVC, polypropylene, or PVDF; diaphragms from EPDM or PTFE; actuators from glass-filled polypropylene. The corrosion-resistant actuators feature preloaded spring sets for safe opening. The compact and lightweight valves are offered in three series. The FC series provides a 105-psi maximum control pressure for fail-safe to close; the FO (fail- safe to open) and DA (double-acting) series provide a 60-psi maximum control pressure. All three types offer a maximum ambient temperature range of 32° to 122°F. Available accessories include manual-override remote position indicators, pilot valves, and valve positioners. (Semicon West, San Francisco, South Hall, Booth 2904A; North Hall, Booth 5144)
Pressure ControllerNor-Cal Yreka, CA
Featuring an ASIC, the Intellisys adaptive pressure controller provides microstepping direct drive with up to 60* positional resolution at high speeds. The controller incorporates 2- and 4-in. throttling butterfly valves. Sensing back EMF eliminates the need for microswitches. A preventive maintenance indicator is standard. (Semicon West, San Francisco, South Hall, Booth 1315)
Cleanroom GarmentsPolyConversions Rantoul, IL
Made of polyolefin resins, impervious VR protective wear includes aprons and gowns designed for full frontal coverage with no seams or folds that can entrap particles. Gown thumb loops provide an unencumbered transition from sleeve to glove. Boot soles attach to shoes to ensure user comfort and safety. Boot leggings feature an elastic top that covers and secures the pant leg below the knee. To meet Class 100 cleanroom specifications, the lightweight garments are processed, folded, and individually packaged in heat-sealed bags in order to minimize surface resistivity and particle contamination. Free test samples are available.
ProfilometerSurface/Interface Sunnyvale, CA
A nondestructive CD metrology tool, the Stylus NanoProfilometer provides deep-submicron measurements of lines, trenches, and other features. All features are quantitatively characterized without physical cross-sectioning. The instrument combines elements of traditional scanning probe microscopy and stylus profilometry with force- and angle-controlled sensing technologies. The automated tool can be used to evaluate focus/exposure matrix arrays for photomask stepper characterization and 3-D CD metrology. An in-fab utility permits recipe-level operation by technicians. The instrument can also be used as a calibration tool for CD-SEMs. (Semicon West, San Francisco, Esplanade, Booth 4125)
Temperature Control SystemsBay Voltex Livermore, CA
A series of single- and multichannel temperature control systems features magnetically coupled pumps as well as O-ring—based sealing for leak-free operation. Uptime is better than 99%. The plug-compatible systems suit most etch, CMP, and deposition applications. All are SEMI S2-93 and CE certified. Available systems provide fluid compatibility with water/glycol and DI water uses. The systems accommodate temperatures from —40° to 130°C. (Semicon West, San Francisco, Esplanade, Booth 4136)
Wafer-Temperature ToolSensArray Santa Clara, CA
The palm-sized Thermal Track uses Process Probe wafers equipped with multiple embedded temperature sensors to measure wafer temperature directly in real time in lithography, CVD, RTP, and other processes. The Windows-based measurement tool's hardware and software run on a lithium-ion battery five times longer than did the previous models. Portability and predefined tests facilitate regular performance of maintenance checks. The enhanced system offers an acquisition rate of 100 ms in some applications and provides a strip chart displaying temperature versus time for each sensor location. Absolute accuracy is ±0.1°C, while point-to-point precision is ±0.05°C. (Semicon West, San Francisco, North Hall, Booth 5168)
Bulk Gas RegulatorDräger Tescom Selmsdorf, Germany
The 15-series bulk gas regulator features a flow capacity of Cv = 8. It is made of 316L stainless steel and has 10-µin. Ra internal finishes, a rated flow of 1100 L/min, and reduced threads in wetted areas. For efficient purging, there are minimal entrapment areas. Versions are available with spring adjust, wrench adjust, or air activation, and port sizes to 2 in. The regulator has an inlet pressure rating of 20 bar and outlet pressure range of 0—9 bar. In combination with an ER3000 electronic controller, it provides closed-loop pressure control.
Product Extra!Yield Dynamics has introduced a suite of semiconductor-specific analysis routines called Yield Wizard. A module for the company's Genesis yield management software, the toolset offers commonality reports, difference reports, equipment comparisons, outlier analysis, split-lot analysis, and detection of parametric shifts. The suite gives yield engineers a sequence of tasks they can use to perform analyses in seconds either off-line or in situ. The toolset accepts information from a variety of database and fab sources, including equipment made by Applied Materials and KLA-Tencor. Information: 408/330-9320, ext. 101. (Semicon West, San Francisco, Yerba Buena Ballroom, Booth 8204) A hazardous-gas monitor from Q4D uses the piezoelectric properties of a quartz crystal microbalance to detect trace levels of entire families of hazardous gases. The monitor comes in acid gas, hydride gas, hydrogen, and dual-gas versions. The acid and hydride gas models detect all species within these families. The hydrogen model is selective for the gas and is not cross sensitive to chemicals that can commonly cause interference, such as IPA. The dual-gas model is a point-of-use monitor that detects and differentiates acid and hydride gases in the same sensor. It measures 9 sq in., weighs 24 oz, and can be installed anywhere in the fab without the need to run a sample tube to a central location, according to the manufacturer. Information: 203/794-1100. (Semicon West, San Francisco, South Hall, Booth 2526) Simco's periodic verification kit performs electrostatic measurements that require a portable charge-plate monitor. The kit performs many tests normally done with laboratory equipment. Tests determine ionizer discharge time, ion balance, static propensity, triboelectric charge analysis, and static dissipation. The kit comprises a period test meter, 100-V dual-polarity charger, a test plate measuring 1 * 21/2 in., a 6 * 6-in. test plate, cable, and tripod. The noncontact static test meter features measure and hold functions. In the former mode, the tester provides continuous measurement. The hold mode freezes the meter reading to allow use inside equipment and other hard-to-reach locations. The dual-polarity charger charges the test plate in order to measure decay time, to charge probes for measuring voltage suppression, and to calibrate measurement test setups. The system's carrying case measures 12 * 8 * 4 in. Power is supplied by 9-V alkaline batteries, which are included. Information: 215/822-2171. (Semicon West, San Francisco, Esplanade, Booth 4310) Semitool says its LT-210c tool successfully completed marathon performance testing for copper interconnect plating. The system demonstrated a throughput of 70 or more wafers per hour with 2% nonuniformity on 0.8-µm film. It features real-time, closed-loop bath analysis and replenishment for precise maintenance of organic additives and inorganics. The company will introduce a 300-mm-compatible version later this year. Information: 800/548-8495. (Semicon West, San Francisco, South Hall, Booth 726) Corzan chlorinated polyvinyl chloride (CPVC) piping and ducts from BFGoodrich has been recognized under the Factory Mutual 4910 test standard for cleanroom materials. The standard covers fire propagation, smoke damage, and corrosion damage performance. CPVC is an economical alternative to materials such as ECTFE and PTFE, the company says. The white-sheet material received previous Factory Mutual approval for use in wet benches. Information: 216/447-5908. National Semiconductor has signed an agreement to use universal system tools and data capture upgrades from Jon Goldman Associates in the chipmaker's installed base of Thermco TMX diffusion furnaces. The contract upgrades National's OS/2 platforms to NT platforms and makes them Y2K compliant. The software performs data collection and analysis of diffusion processes to quickly capture equipment and process information. Information: 714/283-5889. (Semicon West, San Francisco, South Hall, Booth 2931) Three years in development, the M450 photochemical dispensing unit from Integrated Designs incorporates more than 30 additional features and improvements, including safety upgrades and overfill protection. The company has also integrated a Windows 95 program interface in the dispenser. The new unit features an injection-molded Teflon flow path to minimize porosity problems. The previous model, the M400, had an average MTBF of >1 million dispenses. Its successor surpasses this performance level, according to the supplier. Information: 972/389-1201. (Semicon West, San Francisco, South Hall, Booth 1400)
The Athena alignment system from ASM Lithography (ASML) provides a large overlay process window for printing CMP layers such as tungsten and shallow trench isolation features. The off-axis system uses both red and green illumination lasers to determine the position of alignment marks. It also detects seven diffracted orders from each wavelength. The data from these orders enables users to accurately determine each mark's position even after CMP polishing. The two wavelengths ensure that the alignment system tolerates variations in process film thickness, according to ASML. High-speed scanning, fast electronics, and upgraded software algorithms are standard features. Athena is available for ASML's PAS 5500/400B, 5500/550B, and 5500/700B step-and-scan systems. It is an option on PAS 5500/500 and 5500/ 900 step-and-scan tools. Information: 602/383-4040; http://www. asml.com. (Semicon West, San Francisco, Gateway Hall, Booth 3314)
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0.18-µm technologies. It can measure both reticles and wafers without any hardware or software changeover, eliminating a source of error in reticle-to-wafer correlation studies. By characterizing both reticle patterns and the corresponding image on the wafer, the SEM facilitates image transfer and defect printability studies and enables customers to optimize pattern transfer for high productivity and yields. The microscope's ESD-reduction technology, along with advanced metrology algorithms, enables stable photomask images, particularly for DUV MoSI-type phase-shift masks. Full hands-off production metrology is provided with a library-based recipe management system. (Semicon West, San Francisco, South Hall, Booth 426; San Jose, McEnery Hall, Booth 10229)
