Manufacturing Effectiveness Series
series, done in conjunction with International Sematech Manufacturing
Initiative (ISMI), focuses on how chipmakers can reduce costs in
current and next-generation fabs. Contributed articles will examine
advances in such areas as factory and tool productivity, metrology,
and ESH that can help sustain manufacturing efficiency and profitability.
Meeting manufacturing metrology challenges at 90 nm and beyond
fab tool costs with improved equipment productivity
to realize productivity in truly optimized fabs
factory productivity issues in the coming decade
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